Nested supporting structure having position regulation function and application thereof

A supporting structure and nested technology, which is applied in the direction of photo-plate-making process, photo-plate-making process exposure device, micro-lithography exposure equipment, etc. on the pattern surface, can solve the problems of not pursuing productivity and less degrees of freedom, and achieve structural The effect of symmetry, reducing structural mass, and improving interchangeability

Active Publication Date: 2017-11-07
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It is not suitable for some detection experiments, applications that do not pursue productivity, and require less degrees of freedom

Method used

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  • Nested supporting structure having position regulation function and application thereof
  • Nested supporting structure having position regulation function and application thereof
  • Nested supporting structure having position regulation function and application thereof

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Embodiment Construction

[0020] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided for more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0021] According to the embodiment of the present invention, such as Figure 1 to Figure 3 As shown, a nested support structure with position adjustment function is proposed, which is used, for example, to support and adjust the electronically controlled displacement stage 4. A fine-motion stage for moving and fine-tuning the mask disposed thereon. The nested support structure includes an inner support frame 7 for supporting the e...

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PUM

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Abstract

The invention relates to a nested supporting structure having a position regulation function and the application of the nested supporting structure. The nested supporting structure comprises an internal supporting frame and an external supporting frame used for supporting and regulating the internal supporting frame, wherein the internal supporting frame is provided with a plurality of protruding parts protruding in the transverse X direction and the longitudinal Y direction; the external supporting frame comprises two oppositely distributed transverse extending parts extending in the transverse X direction and two oppositely distributed longitudinal extending parts extending in the longitudinal Y direction, so that the external supporting frame is molded to encircle the internal supporting frame along the periphery of the internal supporting frame, the external supporting frame is provided with openings respectively corresponding to the protruding parts of the internal supporting frame, so that the protruding parts of the internal supporting frame are nested into the openings of the external supporting frame, and the external supporting frame supports the internal supporting frame in a nesting form. A position regulating piece is arranged in each opening of the external supporting frame and acts on the corresponding protruding part of the internal supporting frame in the transverse X direction, the longitudinal Y direction and the vertical Z direction, so that the six degrees of freedom of the internal supporting frame is regulated.

Description

technical field [0001] The invention relates to the technical field of precision electric control adjustment, in particular to a nested support structure with position adjustment function and its use for adjusting the reference plane for installing components. Background technique [0002] In the fields of optical performance parameter detection, light source performance parameter detection, and lithography, masks are required, and masks need to be adjusted in various degrees of freedom. At present, it is necessary to use a complex mask stage system to achieve this. Function. For high-precision mask tables, most foreign countries use linear motors to adjust and control long-stroke displacement, combined with voice coil motors and piezoelectric ceramics for micro-control, that is, a set of macro-micro control methods are used. Directly using the linear motor drive method has a simple structure, but requires an ultra-precision linear motor, and direct drive is also prone to v...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70716
Inventor 齐威齐月静王宇卢增雄杨光华李兵刘斌郭馨
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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