Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Bessel-Gaussian beam mask plate based on Mittag-Leffler function

A technology of Gaussian beams and masks, applied in the field of masks, can solve problems that cannot be produced experimentally

Active Publication Date: 2017-08-18
HENAN UNIV OF SCI & TECH
View PDF6 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Bessel beams are just an ideal mathematical model and cannot be produced experimentally

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Bessel-Gaussian beam mask plate based on Mittag-Leffler function
  • Bessel-Gaussian beam mask plate based on Mittag-Leffler function
  • Bessel-Gaussian beam mask plate based on Mittag-Leffler function

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0024] the following to Taking the reticle as an example, a reticle that can generate a MittagLeffler-Bessel Gaussian beam is given for a working wavelength of 532nm. Let the value of the basic topological charge of the encoding vortex phase be m=2; the basic parameters of the MittagLeffler function are as follows , , b =1, L=2, 6, 10; the basic parameters of the Bessel function are as follows . within the function The value is determined by (x,y) (The value interval from -25.6 to 25.6 is 0.1). According to the formula we can get the The transmittance distribution of the mask, figure 1 , figure 2 The intensity distribution of the mask with L being 2 and 6 is given respectively. The black part in the figure indicates that the intensity is 0, and the white part indicates that the intensity is 1. This mask with continuous light intensity distribution can be realized by a spatial light modulator , taking the LWGL532-100mW-SLM model spatial light modulator of Bei...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A Bessel-Gaussian beam mask plate based on the Mittag-Leffler function uses the information optics principle and combines the Mittag-Leffler modulation function, the Bessel-Gaussian beam and the plane wave complex amplitude to obtain the interference light intensity graph to realize the interference recording process of the holographic principle. The interference light intensity graph is the mask plate designed for the invention. The invention has the beneficial effects that the invention provides the Bessel-Gaussian beam mask plate based on the Mittag-Leffler function, which can produce the pattern distribution of any number of optical flaps and has important application value in the fields of multi-particle capturing and the like.

Description

technical field [0001] The invention relates to the technical field of masks, in particular to a Bessel-Gaussian beam mask based on a Mittag-Leffler function. Background technique [0002] In 1987, J. Durnin proposed a free-space non-diffraction beam, that is, the Bessel beam [J.Opt.soc.Am.A, 1987, 651-654]. The optical field distribution on each plane perpendicular to the transmission direction is always the same, and the lateral distribution of the electric field intensity is concentrated, and the width of the main lobe remains unchanged during the transmission process. In addition to the characteristics of directivity, monochromaticity, high brightness and coherence of general laser beams, this beam also has the characteristics of non-diffraction. The non-diffraction characteristic means that the light field is not subjected to diffraction expansion. extensive attention of researchers. [0003] Bessel beams are just an ideal mathematical model and cannot be produced exp...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/00G21K1/00
CPCG02B5/00G21K1/00
Inventor 李贺贺赵天乐马海祥位华亮李晓艳吴瑞琪肖赵云
Owner HENAN UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com