Composite nanoimprint lithography machine and working method

Abstract

The invention discloses a composite nano-imprint photolithography machine and a working method, which solves the problems of large deformation of imprinted graphics, low imprinting precision, and poor imprinting quality. The close cooperation of the platform, under the joint and synergistic effect of positive and negative pressure, can efficiently and automatically complete large-area imprinting and uncovering demoulding, and realize large-area micro-nano patterning on ultra-large-sized rigid substrates. The technical solution is as follows: including a base, on which a workbench is fixed, and a vacuum suction cup is arranged on the movable table of the workbench, and the vacuum suction cup vacuum-adsorbs the base material, and the embossing material is evenly spread on the base material; An embossing module is provided in cooperation, the embossing module includes an embossing assembly and a curing assembly, the embossing assembly includes a roller, the outer surface of the roller is vacuum-adsorbed with a composite soft mold, and the outer surface of the roller is An elastic material layer is covered, and a flexible material layer is provided on the side of the composite soft mold in contact with the roller.

Description

technical field [0001] The invention belongs to the technical field of micro-nano manufacturing, and relates to a composite nano-imprint photolithography machine, in particular to a large-area composite nano-imprint photolithography machine and a working method based on roller assistance and a composite soft mold. Background technique [0002] In order to improve and improve the performance and quality of products in the fields of high-definition flat panel display, high-efficiency solar panels, anti-reflection and self-cleaning glass, LED patterning, and wafer-level micro-nano optical devices, there is a huge need for large-area micro-nano patterning technology. industry needs. The common feature of these products is that large-area complex three-dimensional micro-nano structures need to be manufactured efficiently and at low cost on large-scale non-flat rigid substrates (hard substrates or substrates). However, various existing micro-nano manufacturing technologies (such ...

AI Technical Summary

Problems solved by technology

The problems of this method are: on the one hand, the film soft mold will be deformed under the imprinting force during the imprinting process, and direct curing will cause large deformation of the embossed pattern after curing, resulting in low imprinting accuracy and poor imprinting quality. Poor; on the other hand, imprinting and curing are carried out at the same time, requiring imprinting materials to have fast curing performance (which limits the choice of imprinting materials), and at the same time, there is a problem of incomplete curing (even at very low pressure (2) The embossing force is directly applied to the roller (or the roller shaft). On the one hand, it is difficult to ensure uniform imprinting force, resulting in poor consistency of embossed graphics, and the embossed area is affected. On the other hand, it has poor adaptability to the unevenness of the substrate, especially it is difficult to imprint super-sized substrates and fragile substrates; (3) the rotation of the roller drives the connected air tube to rotate, resulting in the winding of the air tube, The normal and reliable working cycle cannot be realized, especially when the imprinting efficiency is high (the roller rotates very fast), which will cause the equipment to fail to work; (4) The long grooves set on the outer surface of the roller are poorly sealed, and the composite soft mold is difficult to It is completely adsorbed and fixed on the roller (especially as the size of the substrate increases, it becomes very difficult for the composite soft mold to be reliably and completely adsorbed on the roller), so there is poor imprint quality and precision, and low equipment reliability; (5) The structural rigidity and precision of the entire device are poor, and it is difficult to meet the process requirements of large-area nano-imprinting, especially for super-large-sized substrates, it is almost impossible to achieve normal imprinting patterning

[0007] In summary, the existing micro-nano manufacturing processes and methods are still difficult to meet the requirements of large-scale (8 inches or more), non-flat rigid substrates and fragile substrates with large-area patterned industrial-scale production requirements. Seriously affects and restricts the application and promotion of large-area functional surface nanostructures and nanostructure coatings in high-performance glass, high-efficiency solar panels, new generation of high-definition flat panel displays, large-size LED graphics and other industries, and has become a constraint for these new technologies Bottlenecks in Promotion and Application

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