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Error correction and compensation method and device based on calibration board in direct-writing exposure machine

A technology of error correction and compensation method, which is applied in the direction of photolithography exposure device, photomechanical equipment, microlithography exposure equipment, etc. It can solve errors, different exposure parameters and alignment parameters, and affect the quality of imaging results in different areas of exposure, etc. problem, to achieve the effect of low cost, solving poor alignment, convenient and flexible use

Active Publication Date: 2017-05-10
ADVANCED MICRO LITHO INSTR INC
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  • Application Information

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Problems solved by technology

[0003] However, during the production and assembly process of the exposure machine, due to certain errors and position deviations in the mobile platform, system, and exposure components, there will be exposure parameters and alignment parameters used in different areas of the exposure substrate during debugging and measurement in the later stage. Different, there is a certain error, which affects the quality of imaging results in different areas of exposure

Method used

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  • Error correction and compensation method and device based on calibration board in direct-writing exposure machine
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  • Error correction and compensation method and device based on calibration board in direct-writing exposure machine

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Embodiment

[0042] Embodiment: In the present invention, the vertex coordinate values ​​of any two regions on the calibration plate are collected, and the arbitrary regions are quadrilaterals, and the two regions have overlapping parts. The specific implementation method is as follows:

[0043] In area one, first place the calibration plate with equidistant marking points on the platform; then collect the coordinate values ​​at the vertices s1, s2, s3 and s4 of the quadrilateral formed by any position on the calibration plate through the sensor, which is recorded as: (x s1 ,y s1 ), (x s2 ,y s2 ), (x s3 ,y s3 ), (x s4 ,y s4 );

[0044] Then calculate the size expansion and contraction variation of the quadrilateral according to the figure similarity transformation model, the specific method is: the rotation angle in the figure similarity transformation is α, and the expansion and contraction of four vertices x-axis direction is (s1 x , s2 x , s3 x , s4 x ), the expansion and cont...

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Abstract

The invention discloses an error correction and compensation method and device based on a calibration board in a direct-writing exposure machine. The method includes the steps: firstly, acquiring vertex coordinate values of at least one arbitrary area on the calibration board; secondly, determining size expanding and shrinking variation quantity of the area corresponding to the vertex coordinate values according to a graph similarity transformation model and the vertex coordinate values; finally, performing error correction and compensation for a direct-writing exposure machine system according to the size expanding and shrinking variation quantity. According to the method, deformation of graphs of different areas is measured and corrected by the aid of the calibration board, correction and compensation of an exposure device system are achieved, so that the quality exposing imaging results of different areas are improved.

Description

technical field [0001] The invention belongs to the technical field of printed circuit board processing and manufacturing, and in particular relates to an error correction and compensation method based on a calibration plate in a direct writing exposure machine and a device thereof. Background technique [0002] At present, there are two types of exposure equipment for printed circuit boards: traditional projection exposure equipment and direct writing exposure equipment. The traditional projection exposure equipment will have already printed the graphics on the film negative, and transfer the graphics to the photosensitive dry film through the projection film negative; the other type is the direct writing exposure equipment, and the light beam directly scans the exposure pattern onto the photosensitive dry film. , In direct-write exposure equipment, the conversion from CAM data to laser graphics is generally completed with the help of a programmable graphics generator. Com...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2051G03F7/70491G03F7/7055
Inventor 蔡志国朱俊伟
Owner ADVANCED MICRO LITHO INSTR INC
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