Rapid epitaxial wafer exposure device
A technology of exposure device and epitaxial wafer, which is applied in the direction of printing device, optics, printing equipment, etc., to achieve the effects of convenient operation, prolonging service life, and improving the degree of braking and intelligence
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[0018] The present invention is described in further detail now in conjunction with accompanying drawing. These drawings are all simplified schematic diagrams, which only illustrate the basic structure of the present invention in a schematic manner, so they only show the configurations related to the present invention.
[0019] Such as figure 1 The preferred embodiment of the rapid epitaxial wafer exposure device of the present invention shown includes an image aligner 1, and a digital electronic polarized picture capture structure 2 is arranged on the top of the image aligner 1, and between the digital electronic polarized picture capture structure 2 and the image aligner 1 An exposure lamp 3 is installed, and the digital electronic polarization frame capture structure 2 is connected to the image aligner 1 through an adjustable device. The bottom of the image aligner 1 is located on an operating platform 4, and the image aligner 1 and the operating platform 4 are hinged. The...
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