Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Vacuum device for atomic interference gravity measurement

A vacuum device and atomic interference technology, applied in measurement devices, gravitational field measurement, geophysical measurement, etc., can solve the problem of inability to evaluate window wavefront distortion, avoid wavefront distortion effects, reduce device weight, and enhance stability Effect

Active Publication Date: 2017-04-26
HUAZHONG UNIV OF SCI & TECH
View PDF4 Cites 22 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the defects of the prior art, the purpose of the present invention is to provide a vacuum device for atomic interference gravity measurement, aiming to solve the problem that the wavefront distortion of the window under the vacuum device cannot be evaluated

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vacuum device for atomic interference gravity measurement
  • Vacuum device for atomic interference gravity measurement

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0021] In order to reduce the influence of the wave front distortion effect and explore the miniaturized atomic interference gravimetric measurement scheme, the present invention provides a compact and miniaturized vacuum device suitable for atomic interference gravimetric measurement. The vacuum device suitable for atomic interference gravity measurement provided by the present invention includes two-dimensional magneto-optical trap parts, three-dimensional magneto-optical trap parts, interference parts, detection parts and optical element parts; its main features are compact structure, good sta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a vacuum device for atomic interference gravity measurement, which comprises a two-dimensional magneto-optical trap component, a three-dimensional magneto-optical trap component, an interference component, a detection component and an optical component, wherein the two-dimensional magneto-optical trap is used for atom two-dimensional cooling; the three-dimensional magneto-optical trap component is a tetrakaidecahedron after eight vertex angles are cut from a cube for three-dimensional cooling for atoms after two-dimensional cooling and tossing cooled atoms; the interference component is a cylindrical hollow pipeline for Raman laser incidence; the interference component enables interference to happen to the atoms under mutual effects of stimulated Raman transition laser and tossed atoms; the detection component is cubic for detecting the transition probability of atoms after interference; and the optical component is used for reflecting the incident Raman laser, and together with incident laser, a stimulated Raman transition laser pair is formed. The device height is greatly reduced, the weight of the device is lessened, the device is more flexible, and the stability is greatly enhanced.

Description

technical field [0001] The invention belongs to the technical field of atomic interference gravity measurement, and more specifically relates to a vacuum device for atomic interference gravity measurement. Background technique [0002] In the past two decades, atomic interferometry has been rapidly developed and widely used. Because of its potential high sensitivity and quantum properties, it has been used in the field of precision measurement to measure gravity, gravity gradient, rotation, fine structure constant, Measurements of magnetic field gradients, gravitational constants, etc. are also used to test some basic principles of physics. It has important application prospects in basic scientific research, gravity measurement, resource exploration, gravity-assisted navigation and other fields. Among them, atomic interference gravimetry is one of its most important applications, and it is also one of the most successful applications at present. [0003] The atomic interfe...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01V7/02
CPCG01V7/02
Inventor 胡忠坤罗覃周敏康张恒陈乐乐段小春
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com