Method and device for detecting material uniformity of optical glass

Abstract

The invention proposes a method for detecting material uniformity of optical glass, which divides the inspected mirror into at least three sub-aperture areas, calculates the material uniformity of each sub-aperture area, and then uses the sub-aperture splicing algorithm to calculate the material of the inspected mirror In addition, the tilt attitude of the inspected mirror is monitored and corrected by the monitoring interferometer and the side plane mirror, so the tilt states of the uniformity test results of different sub-apertures are completely consistent, and the defocus and image in the uniformity The amount of "tilt" introduced in scattered sub-aperture interference detection results can be faithfully preserved, thereby avoiding discontinuous stitching traces in the full-aperture uniformity of the inspected mirror. The method proposed by the present invention can not only realize the absolute detection of all wave aberrations of material uniformity in the process of using a small-caliber phase-shifting interferometer to detect the uniformity of large-caliber optical glass materials, but also can eliminate discontinuous splicing traces. detection error.

Description

technical field [0001] The invention relates to the technical field of optical interference measurement, in particular to a method and device for detecting material uniformity of optical glass. Background technique [0002] High-precision optical imaging lenses are usually composed of multiple optical lenses. In order to achieve ideal imaging quality, the transmitted wavefront of the optical lens is required to reach the diffraction limit, and the material uniformity of the optical glass is one of the main sources of the transmission wavefront error of the optical lens. . In addition, when using the zero-position compensation mirror method to detect the aspheric mirror surface shape, in order to obtain high-precision aspheric surface shape detection results, it is necessary to correct various error sources of the zero-position compensation mirror, including the uniformity of the glass material of the compensation mirror. Effects of aspheric wavefronts. In the above applica...

AI Technical Summary

Problems solved by technology

For the detection of the uniformity of large-aperture optical glass materials, it is too expensive to directly use large-aperture interferometers to solve the above problems. The existing technology cannot even manufacture interferometers and optical etalons that meet the requirements of caliber and test accuracy. Therefore, small-aperture based Interferometer combined with sub-aperture splicing technology to solve the problem of uniformity detection of large-aperture optical glass materials

However, the above solutions cannot test the defocus and astigmatism in the uniformity of materials with high precision, and because the tilt attitude of the inspected mirror is prone to change when the mirror is moved, the stitching process leaves discontinuous stitching in the final uniformity test results traces, resulting in increased uniformity test error

Images