Multi-station rotating stand device for washing and drying equipment and method for cleaning wafer
A multi-station, turntable technology, which is applied to cleaning methods and appliances, chemical instruments and methods, electrical components, etc., can solve the problems of lower qualified rate of finished products, low work efficiency of turntable, poor drying effect, etc., to improve Work efficiency, good cleaning effect, easy disassembly effect
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[0035] The multi-station turntable device of this washing and drying equipment includes a turntable bottom plate 2 arranged horizontally, a turntable upper plate 1 that is directly above the turntable bottom plate 2 and is parallel to the turntable bottom plate 2, and is vertically located on the turntable bottom plate 2. The station structure between the frame bottom plate 2 and the turntable upper plate 1; there are at least two identical station structures on the turntable device, and these station structures are evenly spaced and divided on the turntable device; the turntable device A vertical turntable small shaft 5 is also provided at the center position of the upper surface of the frame upper plate 1 .
[0036] Such as Figure 1 to Figure 6 As shown, in this embodiment, the same station structure is arranged on the turntable device, which is symmetrical about the rotation center of the turnframe device at 180°. At this time, since there are two stations, the upper plate...
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