Photosensitive device and its preparation method, photosensitive detector

Abstract

The invention provides a photosensitive device and a manufacturing method thereof and a photosensitive detector. The photosensitive device comprises a first electrode, a second electrode, an active photosensitive layer, a first insulating layer and a transparent electrode layer, wherein the first insulating layer is formed on the first surface of the active photosensitive layer; the transparent electrode layer is formed on the surface, opposite to the active photosensitive layer, of the first insulating layer; the first electrode and the second electrode are formed on one side of the second surface, opposite to the first surface, of the active photosensitive layer; the first electrode and the second electrode are connected with a first power supply, the transparent electrode layer is connected with a second power supply, and potential symbols provided by the first power supply and the second power supply are opposite. According to the photosensitive device, the concentration of electrons or holes approaching the first electrode and the second electrode can be improved, so that the photosensitive current can be increased and then the photosensitive precision is improved.

Description

technical field [0001] The invention belongs to the technical field of liquid crystal display, and in particular relates to a photosensitive device, a preparation method thereof, and a photosensitive detector. Background technique [0002] figure 1 For the structural schematic diagram of the photosensitive device of the existing MSM photosensitive detector, please refer to figure 1 , the photosensitive device includes from bottom to top: substrate 1, buffer layer 2, metal electrodes 3 and 4, active photosensitive layer 5, insulating layer 6, the working principle of the photosensitive device is: active photosensitive layer 5 receives photons from the outside And converted into electrons, and then through the voltages loaded on the metal electrodes 3 and 4 respectively, and there is a voltage difference between the two voltages, so that the voltage difference makes the electrons move, thereby forming a current (called photosensitive current), also That is, the optical signa...

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Problems solved by technology

[0003] However, in practical applications, in order to make the optical signal fully absorbed by the active photosensitive layer 5 without passing through the active photosensitive layer 5, the thickness of the active photosensitive layer 5 is generally set thicker, and since the optical signal is In the active photosensitive layer 5, it is gradually absorbed and converted along its transmission direction, therefore, the light signal close to the metal electrodes 3 and 4 is gradually reduced, thus causing a low concentration of electrons generated near the metal electrodes 3 and 4, such as figure 2 As shown, resulting in a small photosensitive current, and thus the photosensitive accuracy is not high

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