Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A composite ald air guiding device

An air guide and composite technology, which is applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problem of uneven film preparation, and achieve the effects of improving uniformity, improving airflow distribution, and saving space.

Active Publication Date: 2018-10-16
SHANGHAI NAT ENG RES CENT FORNANOTECH
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to overcome the deficiencies of the prior art, the present invention proposes a composite ALD air guide device, which can effectively optimize the airflow distribution in the reaction chamber by adjusting the airflow distribution of the pumped air, and solve the preparation problems caused by uneven airflow in the chamber. Film unevenness

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A composite ald air guiding device
  • A composite ald air guiding device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] Such as figure 1 , and 2 are structural schematic diagrams of a preferred embodiment of the present invention. The composite ALD air guide device includes a main structure composed of a plane step (1) and an arc wall (2), and a guide The air hole array (3) and the air extraction hole (4). Plane steps (1), the middle part is used to arrange air guide holes, and the platforms on both sides are used to install sample holders in the chamber; the arc wall (2), whose radian is the same as that of the reaction chamber, is easy to install on the inner wall of the reaction chamber; the air guide hole array ( 3), the holes run through in the vertical direction, the hole diameter is 1-3mm, and they are evenly distributed in a rectangular shape. The hole spacing is 10mm~50mm, and they are connected with the inside of the device and the pumping holes, used for diversion during the gas pumping process, and optimize the cavity Airflow distribution; the air extraction hole (4), connec...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a composite ALD gas guiding device which comprises a main structure, a gas guiding hole array (3) and a gas extraction hole (4), wherein the main structure is composed of plane steps (1) and a circular arc wall (2). According to the ALD gas guiding device provided by the invention, gas is guided by performing gas extraction on a reaction cavity, so that the gas flow distribution in the reaction cavity can be improved and the uniformity of a prepared thin film can be effectively improved; and meanwhile, a composite structure is utilized for greatly saving space, so that composite ALD gas guiding device can be served as a mechanism for supporting a sample hole in the reaction cavity when bearing the gas guiding function, and function composition can be achieved.

Description

field of invention [0001] The invention relates to an ALD (atomic layer deposition) system, a device used for gas guiding in a reaction chamber. Background technique [0002] According to the reaction principle of ALD, in the prior art, the ALD precursor enters the reaction chamber through the pipeline system, and adsorbs with the substrate surface in the chamber within a limited time, and two consecutive different gases react on the substrate surface, resulting in Deposition of an atomic layer. In order to ensure that the reaction precursor can fully and uniformly adsorb to the substrate in the wall within a limited time, the structure of the reaction chamber and the inlet nozzle are generally designed to optimize the airflow distribution in the chamber. However, for a reaction chamber with a relatively complex structure or a large size reaction chamber, it is not enough to design the nozzle or chamber structure only limitedly. It is also necessary to optimize the design o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455
CPCC23C16/45544
Inventor 何丹农尹桂林金彩虹
Owner SHANGHAI NAT ENG RES CENT FORNANOTECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com