High sensitivity PVDF film

A high-sensitivity, silica-gel layer technology, applied in the field of sensors, can solve the problems of PVDF film perception sensitivity to be improved, achieve high potential value, improve perception sensitivity, and good technical effects

Inactive Publication Date: 2016-04-27
TIANJIN FANKAI TECH & TRADE
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in recent years, a variety of new application fields have put forward higher requirements for its performance, especially the perception ability. Sensitivity needs to be improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High sensitivity PVDF film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0010] A high-sensitivity PVDF membrane, comprising a silica gel layer 1, a PVDF layer 2, and a ceramic layer 3, wherein the ceramic layer 3 is located at the bottom of the high-sensitivity PVDF membrane, the silica gel layer 1 is located at the top of the high-sensitivity PVDF membrane, and the PVDF layer 2 Located between the silica gel layer 1 and the ceramic layer 3, the surfaces of the above silica gel layer 1, PVDF layer 2 and ceramic layer 3 are tightly bonded to form a whole, and the thickness of the ceramic layer 3 is not greater than the thickness of the PVDF layer 2.

[0011] The embodiments of the present invention have been described in detail above, but the content is only a preferred embodiment of the present invention, and is not intended to limit the present invention. All modifications, equivalent replacements and improvements made within the application scope of the present invention shall be included in the protection scope of the present invention.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a high sensitivity PVDF film. The high sensitivity PVDF film is introduced with a silica gel layer on the basis of a PVDF piezoelectric film structure in the prior art, the characteristic of high elasticity of the silica gel layer is utilized to amplify an oscillation signal for improving movement of the film, and thereby sensing sensitivity of the PVDF film is improved. The high sensitivity PVDF film realizes the excellent technology effect, has a relatively simple structure, has the remarkable effect and further has extremely high potential values.

Description

technical field [0001] The invention relates to the technical field of sensors, in particular to a high-sensitivity PVDF membrane Background technique [0002] PVDF membrane is widely used in various sensors, and the membrane is generally recognized for its sensitive sensing ability and outstanding response speed. However, in recent years, a variety of new application fields have put forward higher requirements for its performance, especially the perception ability. Sensitivity needs to be improved. Contents of the invention [0003] The purpose of the present invention is to provide a high-sensitivity PVDF membrane to achieve a more sensitive detection effect, aiming at the technical defects of the prior art. [0004] To achieve the above technical purpose, the present invention adopts the following technical solutions: [0005] A high-sensitivity PVDF membrane, comprising a silica gel layer, a PVDF layer, and a ceramic layer, wherein the ceramic layer is located at th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01L41/08G01H11/08
Inventor 彭志刚
Owner TIANJIN FANKAI TECH & TRADE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap