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Photoresist barrel with quantification and extrusion functions

A photoresist and functional technology, applied in the direction of unloading device, internal accessories, etc., can solve the problem of liquid crystal panel photoresist waste and other problems, and achieve the effect of facilitating transportation, improving utilization rate and ensuring stability

Inactive Publication Date: 2016-02-24
刘幸
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of the above technologies, the present invention provides a photoresist barrel with weight and extrusion functions, which solves the problem of photoresist waste in the production process of liquid crystal panels

Method used

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  • Photoresist barrel with quantification and extrusion functions
  • Photoresist barrel with quantification and extrusion functions

Examples

Experimental program
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Effect test

Embodiment Construction

[0023] Such as figure 1 As shown, a photoresist barrel with weight and extrusion functions includes a cavity composed of a barrel mouth, a barrel wall, and a barrel bottom, and a drainage tube arranged at the barrel mouth, and a partition plate is arranged in the cavity , the outer side of the barrel wall is provided with a valve to control the closing of the partition plate, the drainage pipe includes an upper pipe and a lower pipe, the upper pipe is provided with an adjustment rod for adjusting the telescopic length of the lower pipe, and the bottom of the lower pipe It has a slope structure and is tangent to the partition plate. An extrusion plate is arranged in the storage cavity, and a support rod is connected above the extrusion plate to drive the extrusion plate to slide along the inner wall of the cavity. The support rod and the drainage tube are connected with the photoresist suction device through the photoresist pipeline.

[0024] Further, the length of the lower p...

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Abstract

The invention discloses a photoresist barrel with quantification and extrusion functions. The photoresist barrel comprises a cavity composed of a barrel opening, a barrel wall and a barrel bottom and a drainage pipe arranged at the barrel opening. Separation plates are arranged in the cavity. A valve for controlling the separation plates to be closed is arranged on the outer side of the barrel wall. The drainage pipe comprises an upper pipeline and a lower pipeline. The upper pipeline is provided with an adjusting rod for adjusting the stretching / retracting length of the lower pipeline. The bottom of the lower pipeline is of an inclined face structure and tangent to the separation plates. An extrusion plate is arranged in the containing cavity. Supporting rods for driving the extrusion plate to slide along the inner wall of the cavity are connected to the position above the extrusion plate. The supporting rods and the drainage pipe are connected with a photoresist suction device through a photoresist pipeline. According to the photoresist barrel, the utilization rate of photoresist is increased, and the photoresist can be stored longer after the barrel is unsealed.

Description

technical field [0001] The invention relates to a photoresist barrel, in particular to a photoresist barrel with weighting and extrusion functions. Background technique [0002] Photoresist is an important raw material in the liquid crystal panel industry. Its composition is special and expensive. How to extend the validity period of photoresist and improve the utilization rate of photoresist has always been an important breakthrough direction to reduce the cost of photoresist use. [0003] In order to solve the above problems, you can change the structure of the photoresist barrel to change the flat bottom into a round or "V" shape, but these are only the photoresist residues at the bottom of the barrel, and the photoresist residue on the barrel wall has been ignored. part. [0004] At the same time, due to its special composition, a barrel of photoresist after opening generally needs to be used up within a specified time, and the storage time of the photoresist after open...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B65D25/06B65D25/52B65D25/02
Inventor 刘幸
Owner 刘幸
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