A method of generating current extraction threshold voltage of mosfet based on leakage control
A threshold voltage and current extraction technology, which is applied in the field of microelectronics, can solve problems such as complex differential calculations and test procedures, and achieve the effects of simple calculation, fast measurement, and avoiding errors
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[0019] (1) The N-type MOSFET of the experimental sample has a gate length of 0.28 μm and a gate oxide layer thickness of 4 nm, such as figure 1 ;
[0020] (2) Scan the drain voltage, such as figure 2 , the source electrode is suspended, and a large drain voltage V is applied to the gate electrode G , V G =1V;
[0021] (3) see image 3 , sweep gate voltage V D From -0.2V to 1V, the measured I DC current;
[0022] (4) Obtain the current curve I generated by leakage control DC From the inversion region to the depletion region corresponding to the mutation point T point, its corresponding V D (T)=0.712V;
[0023] (5) Find the difference between the gate voltage and the drain voltage corresponding to point T at this time: V G -V D (T)=1-0.71=0.29V, the threshold voltage V of this device T That is 0.29V.
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