SMC (Sequential Monte Carlo) algorithm based acoustic emission source location method
A sequential Monte Carlo, acoustic emission source technology, applied in the direction of using acoustic emission technology for material analysis, etc., can solve the problem of acoustic emission source positioning influence uncertainty, non-consideration and other issues
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[0028] The present invention will be further explained below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the following specific embodiments are only used to illustrate the present invention but not to limit the scope of the present invention. It should be noted that these drawings are all simplified schematic diagrams, and only schematically illustrate the basic structure of the present invention, so they only show the configurations related to the present invention.
[0029] The acoustic emission source location method based on the sequential Monte Carlo algorithm described in the present invention is used for the location of the acoustic emission source under the influence of uncertainty factors, and the location method mainly considers the uncertainty caused by model error and measurement noise Impact; includes the following steps:
[0030] (1) For the acoustic emission source on the isotropic planar structure, arran...
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