Sensor and method for manufacturing a sensor
一种传感器、衬底的技术,应用在传感器领域,达到简化制造的效果
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[0036] In the different figures, identical components are always provided with the same reference symbols and are therefore generally also described or illustrated only once in each case.
[0037] exist figure 1 A sensor 1 according to an embodiment of the invention, in particular an acceleration sensor and / or a rotational speed sensor, is shown in a sectional view, wherein the basic structure of the sensor 1 is mainly described here. Here, the basic structure comprises a microelectromechanical element (MEMS element) 1' movable relative to the substrate 15 of the sensor 1 and a fixed structure 9 to which the MEMS element 1' is spring-elastically coupled. An offset or offset movement of the movable element 1' can be detected by the sensor 1 as a function of the capacitance change.
[0038] A movable MEMS element 1' is produced by means of an etching method from a (relatively thick) epitaxially (on the substrate 15 of the sensor 1 ) deposited polysilicon layer 2 (epitaxial pol...
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