Magnetic sealing device for reaction chamber

Abstract

The invention discloses a magnetic sealing device for a reaction chamber. A first magnet and a second magnet which are matched are arranged between corresponding positions of a reaction chamber door hole and a reaction chamber door, the second magnet is connected with the reaction chamber door through a spring, the reaction chamber door hole can be sealed and opened through the heteropolarity attraction principle of the magnets and the tension of the spring, and after a mechanical hand retracts from the reaction chamber, the reaction chamber can be reliably sealed in time. The magnetic sealing device has the remarkable advantages of being simple in structure, easy to obtain and capable of being widely applied to sealing semiconductor washing equipment, an oxidizing furnace and other equipment.

Description

technical field [0001] The invention relates to the field of semiconductor equipment, and more particularly, to a magnetic sealing device for a reaction chamber. Background technique [0002] During the production and processing process of semiconductor integrated circuits, semiconductor wafers (including optical discs or flat panel displays, etc.) usually go through multiple process steps such as film deposition, diffusion, heat treatment, etching, polishing, and cleaning. Many processes are carried out in the reaction chamber, and the wafer is transferred into the reaction chamber by a robot. In order to isolate the reaction chamber from the external environment, prevent the process conditions of the reaction chamber from being disturbed, and avoid adverse reactions and contamination of the wafer, it is necessary to establish a good seal for the reaction chamber. [0003] For example, regarding the cleaning process of wafers, with the development of semiconductor process ...

AI Technical Summary

Problems solved by technology

However, the disadvantage of simply using rubber seals as the sealing medium is that the rubber seals are easily corroded or deformed by high-temperature radiation, resulting in seal failure, and when the reaction chamber door is not evenly pressed against the reaction chamber door hole , is also prone to leakage

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