Large aperture optical element double exposure phase measurement device and measurement method
A technology of optical components and phase measurement, which is applied in the direction of testing optical performance, etc., to achieve the effects of high resolution, broad market prospects and simple structure
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[0045] The present invention will be further described below in conjunction with the examples and drawings, but the examples should not limit the protection scope of the present invention.
[0046] Please see first figure 1 , figure 1 It is a schematic diagram of the phase measurement device for large-aperture optical elements realized by secondary exposure. As shown in the figure, the coherent light emitted by the laser 1 passes through the beam expander 2 and is focused by the focusing lens 4. After passing through the focus, a random phase plate 5 placed near the focus is formed. The scattered light spot is recorded by a light spot detector 7. The large-aperture optical element 3 to be measured is placed close to the front of the focusing lens 4. The random phase plate 5 is fixed in the optical path by a two-dimensional electric displacement stage 6. The displacement stage 6 is connected with the light spot detector 7 and the computer 8 .
[0047] The random phase plate 5...
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