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X-ray multilayer film structure aiming at response of multiple working energy points

An X-ray and multi-layer film technology, applied in the field of X-ray microscope structure for plasma diagnosis, can solve the problems of increasing subject cost and development cycle, spending a lot of time on installation and disassembly, etc., to reduce the ICF physical experiment cycle and increase the coating film. Difficulty, the effect of reducing complexity

Inactive Publication Date: 2015-04-29
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In this process, it is necessary to design and prepare multi-layer film systems for different X-ray backlight energy points, process the mechanical structure of the KB objective lens, and install and adjust the system in the laboratory, which greatly increases the project cost and development cycle; On the one hand, when switching between different energy point ICF physical experiments, it takes a lot of time to install and dismantle the corresponding energy point KB system

Method used

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  • X-ray multilayer film structure aiming at response of multiple working energy points
  • X-ray multilayer film structure aiming at response of multiple working energy points
  • X-ray multilayer film structure aiming at response of multiple working energy points

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Embodiment

[0029] An X-ray multilayer film structure responding to multiple working energy points, including a KB objective lens coated with multiple film systems responding to X-rays responding to different energy points. like figure 2 As shown, the upper surface of the KB objective lens substrate 1 is coated with the film system C3, and the film system A4 and the film system B5 are coated on the upper surface of the film system C3 at the same time, and the film system A4 and the film system B5 are arranged side by side. Film system A, film system B or film system C are all multilayer film systems, selected from periodic multilayer films, non-periodic multilayer films or transverse gradient multilayer films. In this embodiment, film system A is specifically a Cr / C periodic multilayer film with a thickness of 7.88nm, a thickness ratio of 0.4, and a period of 20, and film system B is specifically a W / C periodic multilayer film with a thickness of 3.9nm. The thickness ratio is 0.42, the ...

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Abstract

The invention relates to an X-ray multilayer film structure aiming at response of multiple working energy points. The structure comprises a KB objective lens, wherein the KB objective lens is coated with multiple film systems aiming at X-ray response at different energy points; the upper surface of a substrate of the KB objective lens is coated with a film system C, the upper surface of the film system C is coated with both a film system A and a film system B, and the film systems A and B are arranged front and back. Compared with the prior art, on the premise of not reducing the imaging performance of the system, the X-ray multilayer film structure aiming at response of multiple working energy points is used for realizing the responsiveness of X-ray at multiple working energy points, so that the structure can be applied to an ICF (inertial confinement fusion) physical experiment at different working energy points by using a same set of KB system. According to the structure provided by the invention, the difficulty and cost of designing and manufacturing multiple KB systems which respectively work at different energy points as well as the complexity level and time for adjusting the system on an ICF device are remarkably lowered.

Description

technical field [0001] The invention relates to an X-ray microscope structure for laser plasma diagnosis, in particular to an X-ray multi-layer film structure used in ICF physics experiments and responding to multiple working energy points. Background technique [0002] X-ray backlight imaging is an important diagnostic tool for high energy density physics (HEDP) and inertial confinement fusion (ICF) research. The Kirkpatrick-Baez (KB) microscopic imaging system is the key equipment for high-temperature and high-density plasma diagnosis in inertial confinement fusion (ICF) research, and has been widely used in foreign OMEGA and LMJ devices. The imaging quality of the KB system based on the principle of grazing incidence reflective imaging varies significantly with the grazing incidence angle. The larger the grazing incidence angle, the higher the spatial resolution, but the selection of the grazing incidence angle should also take into account the limitation of the X-ray en...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/06
CPCG21K1/062G21K1/067
Inventor 穆宝忠章逸舟伊圣振王新王占山
Owner TONGJI UNIV
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