Mobile guide rail mechanism of sapphire wafer cleaner

Abstract

The invention discloses a mobile guide rail mechanism of a sapphire wafer cleaner. The mobile guide rail mechanism comprises a support mobile seat and two optical axis guide rails, wherein the optical axis guide rails are parallelly distributed at two ends of the support mobile seat; a plurality of threaded holes are formed in the bottom parts of the optical axis guide rails; the bottom parts of the optical axis guide rails are provided with guide rail filler strips; the optical axis guide rails and screw rods are installed on a body of the cleaner via threaded holes; the support mobile base is internally provided with four horizontal rollers which are arranged on the upper ends of the optical axis guide rails; four longitudinal rollers arranged in the mobile support seat are positioned at one sides of the optical axis guide rails, and comprise longitudinal screw rods, longitudinal roller bodies, rolling ball bearings, disc-shaped spring washers, flat washers and nylon released nuts; and the longitudinal rollers are matched with threaded holes via the threads at the top parts of the longitudinal screw rods so as to be fixed in the mobile support seat. The rolling friction of the rollers is low, and the rollers have good bearing performance, so that the problems of poor bearing performance of a traditional linear guide rail slide block and high possibility of failure caused by abrasion are solved.

Description

technical field [0001] The invention relates to a moving guide rail mechanism of a sapphire wafer cleaning machine. Background technique [0002] Sapphire wafer cleaning is a very important process in the manufacture of sapphire substrates. It determines the cleanliness of the wafer surface after sapphire annealing or polishing, and whether it meets customer needs. Generally, a single device uses multiple cleaning tanks and uses different ultrasonic waves. Temperature, bubbling and other processes to meet the process requirements. At present, most cleaning machines can automatically extract the cleaning basket, automatically put it into the next tank to continue cleaning and guide the cleaning to complete. The movement of the traditional automatic basket and basket device is carried out by using linear guide rails and sliders, which generate relatively large sliding friction, and the bearing capacity of the guide rail sliders is limited. Long-term operation is easy to wear a...

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the above disadvantages, to provide a sapphire wafer cleaning machine moving guide rail mechanism, the smaller rolling friction force of the roller replaces the larger sliding friction force between the traditional linear guide rail and the slider, and has better Excellent load-bearing performance, reducing the problem of poor load-bearing performance of traditional linear guide rail sliders, which are prone to failure due to wear and tear

Images