Mosaic exposure method for color filter

Abstract

The invention relates to a mosaic exposure method for a color filter. The method includes the following steps: 1) aligning marks and mosaic marks are prepared in the first color filter preparation process (the BM (black matrix) process) for mosaic exposure, and a mosaic area is a public area with two-side exposure, that is, the mosaic area is exposed twice on the two sides; 2) the mosaic exposure in the RGB (red, green, blue) process needs to be carried out according to the aligning marks in the BM process, and the combination precision of the mosaic marks needs to be confirmed; 3) the mosaic exposure in the PS (photoshop) process can be normally carried out according to the aligning marks in the BM process. The method has the following advantages: 1) the method solves the problems that mosaic MURA is easily caused at the mosaic joint of two shots and the requirement for shot mosaic precision is high, and achieves precise jointing without misplacement or broken layers; 2) mosaic MURA is reduced, that is, curve mosaic instead of linear mosaic is used at the mosaic joint, so as to reduce the production of mosaic MURA; 3) a scanning exposure machine is replaced by a proximity exposure machine with a lower price, and the technique is simple.

Description

technical field [0001] The invention relates to a splicing exposure method in a color filter, which can be used in the production process of the color filter to produce large-size products. Background technique [0002] Because the price of the proximity exposure machine is relatively low, and the precision can reach the um level, it is widely used in the production of color filters. However, as the size of the current liquid crystal products is getting larger and larger, from the previous 7 inches. 8 inches to the current one. 55 inches to 108 inches, but the proximity exposure machine cannot handle large-size products due to the curvature of the mask, so more and more color filter manufacturers have to purchase expensive scanning exposure machines. [0003] With the gradual enlargement of the display screen, the effective exposure range of the proximity exposure machine exposure cannot be expanded accordingly (the reason is the influence of the warpage of the mask plate). ...

AI Technical Summary

Problems solved by technology

[0007] The 64.5-inch product is W1439*810 and the effective exposure area of ​​the mask (W880*730) is smaller than the area, so it is impossible to achieve 1 shot exposure and stitching exposure technology is required

[0008] It can be seen that at least 2shout exposure is required to complete the product, but if the above method is used to splice the exposure, it will be very easy to cause splicing MURA at the place where 2sho splicing is required, and the splicing accuracy between shots is required to be high. If it cannot be accurately spliced, it will cause misalignment or faults

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