Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Design method of X-ray flattening filter

A design method and homogenizer technology, applied in radiation/particle processing, using aperture/collimator, nuclear engineering, etc., can solve the problems of increased design time, complicated design process, etc., and achieve low design cost and good homogenization effect. , the effect of short cycle

Active Publication Date: 2015-01-28
重庆真测科技股份有限公司
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the requirement of uniformity and the increase of the number of frustums, the overall design time will also increase significantly
At the same time, the design process of this step-by-step generation method is also very complicated.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Design method of X-ray flattening filter
  • Design method of X-ray flattening filter
  • Design method of X-ray flattening filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0036] figure 1 is a schematic diagram of the homogenizer, image 3 It is a schematic flow chart of the method of the present invention.

[0037] Taking the design of the homogenizer of the 6MeV medical electron accelerator as an example, the method of the present invention is described in detail, figure 2 It is a cross-sectional view of the structure of the 6MeV medical accelerator homogenizer in this embodiment. The technical requirements of this figure are: 1. The dimensional tolerance of the tapered boss is processed according to IT8 grade, and the rest of the dimensional tolerances are processed according to IT10 grade; 2. The material is brass.

[0038] Specifically include the following steps:

[0039] 1) The distance between the leveler base and the ray source target point is L=128mm, and the ray opening angle is 14°. Set up a ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a design method of an X-ray flattening filter. A traditional design method of the flattening filter has the defects of being long in time consumed, high in cost and poor in flattening effect. The design of the multi-stage conical flattening filter is realized through the Monte Carlo method, a data fitting method and the like. The design method can realize a good flattening effect, and the whole process is clean and easy to realize. Meanwhile, the design cost is low and the design period is short.

Description

technical field [0001] The invention relates to a design method for an X-ray homogenizer, in particular to a design method for a multi-stage conical homogenizer based on methods such as Monte Carlo and data fitting for cone beam rays. Background technique [0002] The traditional leveler design method is to design a conical leveler with no more than three levels based on experience, and to achieve the leveling effect through repeated modification of the leveler structure and multiple test measurements. This method takes a long time, is expensive, and has a poor leveling effect. [0003] It was also proposed a leveler design method. This method uses a step-by-step generation method to design a leveler with a multi-stage frustum structure. Each level of cone has to be adjusted many times, which takes a long time. In addition, due to the influence of ray scattering, each new frustum will have an impact on the previous frustum. Therefore, every new level of frustum needs to ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/00
CPCG21K1/02G21K1/025G21K2201/00
Inventor 代志力申济菘陈研
Owner 重庆真测科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com