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A 0.532 micron and 1.064 micron frequency doubling anti-reflection coating for large curvature lens surfaces

A technology of large-curvature lens and anti-reflection coating, applied in optical components, optics, instruments, etc., can solve problems such as damage and increase system noise

Active Publication Date: 2016-04-06
西安应用光学研究所
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This high residual reflection not only increases the system noise, but even brings destructive serious consequences

Method used

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  • A 0.532 micron and 1.064 micron frequency doubling anti-reflection coating for large curvature lens surfaces
  • A 0.532 micron and 1.064 micron frequency doubling anti-reflection coating for large curvature lens surfaces
  • A 0.532 micron and 1.064 micron frequency doubling anti-reflection coating for large curvature lens surfaces

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Embodiment 1 selects K9 glass substrate for use, Ta 2 o 5 When the refractive index is 1.996, it is the standard Ta 2 o 5 Refractive index, the ratio of the radius of curvature of the lens to the aperture is equal to 1. At this time, the lens is a large curvature lens, and the first to twelfth film layers 1 to 12 are plated in sequence, and the thicknesses of the first to twelfth film layers are 11.8nm respectively , 34.5nm, 128.5nm, 15.2nm, 48.3nm, 30.8nm, 65.1nm, 189.9nm, 131nm, 47.9nm, 39.8nm, 130.2nm. After testing, the residual reflectance curves of the lens edge position and the lens center point position at 0.532 μm and 1.064 μm wavelengths were respectively obtained (see image 3 ), the residual reflectivity at the lens edge position at 0.532 μm wavelength = 0.137%, and the residual reflectivity at 1.064 μm wavelength = 0.085%; the residual reflectivity at the lens center position at 0.532 μm wavelength = 0.093%, at 1.064 μm Residual reflectivity at waveleng...

Embodiment 2

[0032] Embodiment 2 selects K9 glass substrate for use, Ta 2 o 5 When the refractive index is 1.996, it is the standard Ta 2 o 5 Refractive index, the ratio of the radius of curvature of the lens to the aperture is equal to 1.5. At this time, the lens is a large curvature lens. The first to twelfth film layers 1 to 12 are plated in sequence, and the thicknesses of the first to twelfth film layers are respectively 11.8nm , 34.5nm, 128.5nm, 15.2nm, 48.3nm, 30.8nm, 65.1nm, 189.9nm, 131nm, 47.9nm, 39.8nm, 130.2nm. After testing, the residual reflectance curves of the lens edge position and the lens center point position at 0.532 μm and 1.064 μm wavelengths were respectively obtained (see Figure 4 ), the residual reflectivity at the lens edge position at 0.532 μm wavelength=0.073%, the residual reflectivity at 1.064 μm wavelength=0.146%; the residual reflectivity at the lens center position at 0.532 μm wavelength=0.093%, at 1.064 μm Residual reflectivity at wavelength = 0.028%...

Embodiment 3

[0033] Embodiment 3 selects K9 glass substrate for use, Ta 2 o 5 When the refractive index is 1.996, it is the standard Ta 2 o 5 Refractive index, the ratio of the radius of curvature of the lens to the aperture is equal to 2. At this time, the lens is a large curvature lens. The first to twelfth film layers 1 to 12 are plated in sequence, and the thickness of the first to twelfth film layers are 11.8nm respectively. , 34.5nm, 128.5nm, 15.2nm, 48.3nm, 30.8nm, 65.1nm, 189.9nm, 131nm, 47.9nm, 39.8nm, 130.2nm. After testing, the residual reflectance curves of the lens edge position and the lens center point position at 0.532 μm and 1.064 μm wavelengths were respectively obtained (see Figure 5 ), the residual reflectivity at the lens edge position at 0.532 μm wavelength=0.184%, the residual reflectivity at 1.064 μm wavelength=0.097%; the residual reflectivity at the lens center position at 0.532 μm wavelength=0.093%, at 1.064 μm Residual reflectivity at wavelength = 0.028%; ...

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Abstract

The invention provides a 0.532 micrometer to 1.064 micrometer frequency-multiplied antireflection coating for use on the surface of a large-curvature lens. The coating comprises a transparent substrate and an antireflection film system. The antireflection film system comprises alternately stacked 12 film layers of high refractive index dielectric film layers and low refractive index dielectric film layers and is applied to the surface of the large-curvature lens having a curvature radius to aperture ratio less than 1; glass substrate adaptability is high; tolerance to the refractive index n of the high refractive index coating material caused by difference in parameters of different coating machines is high, and stability is high; namely, the refractive index of the transparent substrate is applicably 1.46 to 1.60, the refractive index n of the high refractive index material Ta2O5 is 1.946 to 2.126, and optical performances, namely residual reflectivities, of points of the surface of the large-curvature part, at the 0.532 micrometer to 1.064 micrometers wavelength positions, are all greater than 0.4%.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and mainly relates to a frequency doubling antireflection film deposited on the surface of a large curvature lens, in particular to a frequency doubling antireflection film with a frequency doubling of 0.532 microns and a 1.064 micron used on the surface of a large curvature lens Anti-reflective coating. Background technique [0002] 0.532μm and 1.064μm frequency doubled anti-reflection coatings are widely used in laser suppression sighting and sighting systems. Combat effect. The performance of frequency doubling anti-reflection coatings generally includes three aspects: optical properties, physical and chemical properties, and laser damage resistance, among which optical properties and laser damage resistance are closely related to the uniformity of film thickness on the surface of the part. At present, measures to improve the uniformity of film thickness during film deposition gen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/115
Inventor 刘永强杨崇民王养云王颖辉张建付韩俊张万虎李明伟金柯
Owner 西安应用光学研究所
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