Thin film interference effect drawing method based on ray tracer

A technology of ray tracing and thin film interference, which is used in instruments, 3D image processing, image data processing, etc. Effect

Active Publication Date: 2014-12-03
INST OF SOFTWARE - CHINESE ACAD OF SCI
View PDF4 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] In order to overcome the difficulty of drawing the wave effect of the ray tracer, the present invention proposes a method for drawing the interference effect of multi-layer thin films based on ray tracing, which combines the theory of physical optics with ray tracing technology to effectively improve the existing ray tracer ( Such as the ability of PBRT) to draw wave effects; the present invention can also be integrated into the classic 3D modeling software Maya in the form of a plug-in, so that users can directly construct any desired scene and perform spectral rendering through the modeling software , to obtain the required color fluctuation effect, which further improves the drawing ability of the modeling software represented by Maya, which has high application value

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Thin film interference effect drawing method based on ray tracer
  • Thin film interference effect drawing method based on ray tracer
  • Thin film interference effect drawing method based on ray tracer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] A multi-layer film interference rendering method based on the multi-beam interference equation, such as figure 1 shown, including the following steps:

[0035] 1. First obtain the sample of the object to be drawn, and use optical and electron microscopes to observe the surface and section structure of the object respectively. If the surface layer of the object contains a large number of tree structures composed of multi-layer films, it will show a color effect under the light, which can be Apply the interference method of the present invention to continue the following experimental steps, otherwise the selected object samples do not match, and exit the experiment. Then, according to the actual measurement results of the selected object by optical and electron microscopes, the data information of the multi-layer (or single-layer) film structure (including the type of film, the refractive index of each layer, the thickness and the number of film layers, etc.) is pre-desig...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a thin film interference effect drawing method based on a ray tracer. The thin film interference effect drawing method based on the ray tracer comprises the following steps: obtaining multi-layer thin film mixed reflectivity and transmittance by applying a multi-beam interference equation, wherein single-layer film surface reflection coefficient and transmission coefficient can be determined by a Fresnel formula, and a refraction angle in the thin film obeys a Snell law; introducing in a rough surface scattering coefficient by considering that certain thin films generate the irregularity of reflection or transmission light distribution due to roughness to correct the thin film reflectivity and transmittance and simulate complex optical effects, such as colorful highlight, anisotropy and the like; and on the basis of a ray tracer imaging mechanism, constructing a link between physical optics and geometrical optics, and generating a whole scattering formula. The capability of the traditional ray tracer on drawing fluctuation effect is effectively improved, the invention can be continuously integrated into classical 3D modeling software Maya in a plugin way, so that a user obtains required colorful fluctuation effect directly through the modeling software to further improve the drawing capability of the modeling software which takes Maya as a representative, and the invention exhibits high application value.

Description

technical field [0001] The invention relates to a thin-film interference effect drawing method based on a ray tracer, which can apply wave theory to draw a single-layer or multi-layer thin-film interference effect in a ray tracer based on geometric optics, and belongs to the field of realistic rendering of computer graphics imaging. Background technique [0002] Photorealistic rendering (Photorealistic Rendering) is the mainstream rendering technology of existing modeling software such as Maya, 3DMax, etc. It is different from non-realistic rendering technology. Realistically simulate scene information. Most of the existing realistic rendering technologies are based on ray tracers, which use the principle of ray tracing to simulate the propagation process of light in the space scene; by obtaining the material properties of the object, calculate the reflectance or transmittance of light on the object surface, and then recursively trace the light, Finally, the spectral contri...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G06T15/06G06T17/00
Inventor 郑昌文吴付坤
Owner INST OF SOFTWARE - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products