Adsorption Silicon Wafer Coating Rotary Table
An adsorption-type, rotary table technology is applied to devices and coatings that apply liquid to the surface, which can solve the problems of difficult silicon wafers, inconvenient coating, uneven coating, etc. Easy to put and take effect
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[0013] Such as figure 1 and figure 2 As shown, the specific embodiment of the present invention includes a table top 1, on which a circular platform 11 that is concentric with it and arranged radially in a stepped shape is provided. The height of 11 is the same as the height of the silicon wafer or slightly less than the height of the silicon wafer, so that when coating, the edge of the silicon wafer can also be evenly coated.
[0014] In order to facilitate the taking and placing of silicon wafers, an opening 12 extending toward the center of the circle is provided on the edge of the table 1. The opening 12 is in the shape of a semicircle. Preferably, the opening 12 includes two symmetrically arranged up and down and two symmetrically arranged left and right. In this way, the table top 1 is divided into four blades by the opening 12, which not only facilitates the taking and placing of silicon wafers, but also saves materials and reduces costs.
[0015] In order to generat...
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