Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Verification method for visible light scattering characteristic analysis model of space target

A technology of scattering characteristics and space targets, which is applied in the field of space target visible light scattering characteristics analysis model verification, can solve problems such as analysis result errors, and achieve the effect of improving accuracy and reliable input parameters

Inactive Publication Date: 2014-08-27
SHANGHAI AEROSPACE SYST ENG INST
View PDF4 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] If no testing and calibration is carried out, the material reflectance parameters directly provided by the manufacturer or set according to empirical values ​​will often lead to large errors in the analysis results when analyzing the visible light scattering characteristics of space targets. up to 30%

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Verification method for visible light scattering characteristic analysis model of space target
  • Verification method for visible light scattering characteristic analysis model of space target
  • Verification method for visible light scattering characteristic analysis model of space target

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The technical solutions of the present invention are described below through preferred embodiments, but the following embodiments cannot limit the protection scope of the present invention.

[0035] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0036] attached figure 2 It is a step diagram of the verification method for the analysis model of the visible light scattering characteristics of the space target of the present invention. As shown in the figure, the method includes the following steps:

[0037] Step 1: According to the determined test objectives, obtain as much prior information as possible (including geometric parameters and surface material parameters) through various channels, and obtain parameters such as the imaging band, imaging field of view, and imaging focal length of the detector;

[0038] Step 2: Establish the geometric modeling of the test target according to the geometric paramet...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a verification method for a visible light scattering characteristic analysis model of a space target. The method comprises the following steps: acquiring test target prior information and detector parameters; performing test target modeling (including geometrical modeling and surface material modeling); modeling and analyzing the visible light scattering characteristic of the space target; researching a test target scale model; testing the visible light scattering characteristic of the test target scale model; analyzing the visible light scattering characteristic of the test target, and analyzing and comparing test results; verifying the visible light scattering characteristic analysis model of the space target. By adopting the method, the problem of great deviation of the analysis result of the visible light scattering characteristic of the space target due to simple theoretical analysis is solved. The space target visible light scattering characteristic analysis model with a wide application range can be formed through test and verification of a plurality of models of different types, thereby providing accurate visible light scattering characteristic input parameters for different space test mission plans and the research of visible light detection loads.

Description

[0001] technical field [0002] The invention relates to the field of space technology, in particular to a verification method for a space target visible light scattering characteristic analysis model. [0003] Background technique [0004] The use of visible light detectors to detect and track space targets is one of the methods commonly used at home and abroad. Only by obtaining more reliable data on the visible light scattering characteristics of space targets can the successful completion of autonomous capture and tracking tasks be guaranteed. [0005] Visible light sources that irradiate space targets include direct solar radiation and sunlight reflected by the earth. The two are scattered by the target surface and reflected multiple times between each surface, and part of them is transmitted to the detector through mirror reflection or diffuse reflection. [0006] In general, the effect of the Earth reflecting sunlight can be ignored. Specular reflection is generall...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F19/00
Inventor 魏祥泉黄建明颜根廷肖余之刘鲁江姚建唐洁
Owner SHANGHAI AEROSPACE SYST ENG INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com