Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

System management monitoring method and device

A system management and monitoring device technology, applied in the field of system management, can solve the problems of lack of influence and control of monitoring objects, and achieve the effect of effective and precise management and improvement

Active Publication Date: 2014-08-20
UNITED ELECTRONICS
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the existing technology, system management is mainly based on the assessment of result indicators, and there is no particularly effective way to manage and monitor efficiency and effects, thus lacking influence and control over specific monitoring objects

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • System management monitoring method and device
  • System management monitoring method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0051] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0052] see figure 1 As shown, the present invention proposes a system management monitoring method, comprising the following steps:

[0053] Step 1, establish a standard system, including establishing standard procedures and setting parameters.

[0054] Step 101, establishing a standard process in the standard system.

[0055] Before establishing the standard process, it is necessary to obtain the external process node, the identifier of the external process node and the direction of the external process of the external process in the external system as the basis for establishing the standard process.

[0056] Suppose the external process is B, and the external process node is B 1 , B 2 , B 3 , B 4 , corresponding t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a system management monitoring method and device. The method comprises the steps that a standard system is built, mapping is built between a standard flow of a standard system and a flow of an external system, actual data grabbed in the external flow are judged, calculated, stored and checked, the external system can be more accurately and effectively monitored, and therefore various parameters such as actual time of an execution link, the actual execution frequency of the same link within the regulated time, the link return frequency, execution efficiency, accuracy, task loads and health degree are grasped. By means of the system management monitoring method and device, a user can set a system management monitoring way meeting the user requirements according to actual conditions, and the user can more effectively and accurately manage and improve the monitored system according to the obtained data.

Description

technical field [0001] The invention relates to the field of system management, in particular to a system management monitoring method and device. Background technique [0002] With the development of computer technology, system management has extended from traditional management science to the category of software technology. In the existing technology, the system management is mainly based on the assessment of the result indicators, and there is no particularly effective way to manage and monitor the efficiency and effect, so it lacks influence and control over the specific monitoring objects. Contents of the invention [0003] In view of this, the object of the present invention is to provide a system management monitoring method and device, which can monitor external systems more accurately and effectively. [0004] Based on the above purpose, a system management monitoring method provided by the present invention includes the following steps: [0005] Establish a st...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F11/34
Inventor 李志帅加吴烜
Owner UNITED ELECTRONICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products