Evaporation furnace capable of shortening distance and rapidly increasing and reducing temperature, and manufacturing method thereof

Abstract

The invention discloses an evaporation furnace capable of shortening distance and rapidly increasing and reducing temperature, and a manufacturing method thereof. The evaporation furnace comprises an upper heating table and a lower heating table, wherein the upper heating table and the lower heating table are oppositely arranged inside a slot groove up and down; the heating table has the freedom of moving up and down along the slot bracket; the lower heating table has the freedom of rotating along the bottom part of the slot bracket; a sample table capable of loading an evaporation substrate is arranged at the bottom part of the upper heating table; an evaporation source opposite to the sample table is arranged at the top part of the lower heating table; short-wave infrared lamp tubes are inserted into the upper heating table and the lower heating table; and an air inlet and outlet and a cooling water inlet and outlet communicated with the heating tables are arranged inside the upper heating table and the lower heating table. The upper and lower heating tables can achieve the temperature difference which is much greater than that of the traditional equipment within the shortest distance by utilizing up and down opposite mode of dual temperature fields and using a water-cooling cavity; and the evaporation distance and the temperature difference of the upper and lower temperature fields are increased and reduced by adjusting the distance between the upper and lower heating tables, so that adjustable solid-phase evaporation is achieved.

Description

technical field [0001] The invention relates to an evaporation furnace and a manufacturing method thereof, in particular to an adjustable short-distance rapid heating and cooling evaporation furnace and a manufacturing method thereof. Background technique [0002] At present, in a series of material research fields such as photovoltaics and semiconductors, coatings run through the entire material research industry, and vapor deposition is the most extensive research direction. At present, the research field has new directions, and more material research directions are concentrated on solid-state materials. and liquid deposition sources, and the current vapor deposition equipment, due to the high desublimation temperature and fast desublimation speed after the solid material is vaporized, in the previous vapor deposition equipment, it is impossible to solve the problem of high temperature gas phase solid during the transmission process. The phase desublimation phenomenon and ...

AI Technical Summary

Problems solved by technology

[0002] At present, in a series of material research fields such as photovoltaics and semiconductors, coatings run through the entire material research industry, and vapor deposition is the most extensive research direction. At present, the research field has new directions, and more material research directions are concentrated on solid-state materials. and liquid deposition sources, and the current vapor deposition equipment, due to the high desublimation temperature and fast desublimation speed after the solid material is vaporized, in the previous vapor deposition equipment, it is impossible to solve the problem of high temperature gas phase solid during the transmission process. Phase desublimation phenomenon and the large gradient temperature field required for solid phase deposition in a short distance and the problem of achieving control of deposition thickness and film uniformity

Images