Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Columellar strut for nasal tip support

A component and nasal cavity technology, which is applied in the field of bioabsorbable medical devices and can solve problems such as unoptimized nasal tip support treatment methods and the like

Inactive Publication Date: 2013-05-22
ETHICON INC
View PDF7 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although nonabsorbable implants can be used to support the nasal tip, this procedure is not preferred by surgeons due to associated complications such as infection, skin necrosis, and implant extrusion, as well as factors such as patient awareness, appearance method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Columellar strut for nasal tip support
  • Columellar strut for nasal tip support
  • Columellar strut for nasal tip support

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0049] The U-shaped nasal center column support bar of the present invention is thermoformed from a flat polymer sheet consisting of 20% by weight of polydioxanone polymer and 80% by weight of 85 / 15 Blends of copolymers of poly(lactide-co-glycolide) were prepared. Plates were extruded using a 5 / 8" extruder and a 6" slot film die. The extruder and slot die were manufactured by Randcastle Extrusion Systems Inc., Rohan Berlin, NJ, USA. The film die has a temperature between about 160°C and 180°C. The plate has a thickness of about 0.25mm. A strip of membrane is perforated to create the perforations and contours of the device. The support rods have a width of 8mm and a length of 30mm. Two rows of suture holes approximately 1.0 mm wide by 2.5 mm long were formed along a first line approximately 3 mm from the centerline of the spine and a second line 2 mm from the first line. The cavity is formed by die cutting. In a subsequent step, the precut device is placed in a forming di...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Novel bioabsorbable, columellar strut implants are disclosed. The struts are useful in rhinoplasty and nasal reconstruction surgical procedures. The devices have opposed lateral sides (20, 40) connected to a spine (30) member to form a tissue-receiving channel.

Description

technical field [0001] The technical field to which the present invention pertains is bioabsorbable implantable medical devices, in particular bioabsorbable medical devices used in nasal reconstruction surgery. Background technique [0002] Rhinoplasty is a complex surgical procedure that involves modification of the underlying nasal structures such as bone, cartilage, ligaments, and soft fibrofatty tissue. This surgery may be performed for a variety of reasons, including improving the aesthetic appearance of the patient's nose; for post-traumatic reconstruction purposes; correcting various deformities of the patient's nose that may exist; Functional problems of the nasal passages. Regardless of the reason for rhinoplasty, surgeons strive to restore or maintain functionality, repair structural tissue, and at the same time address aesthetic factors by creating and / or maintaining certain proportions between the various parts of the nose and face. [0003] One of the most cha...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61F2/18
CPCA61F2/186
Inventor K.赫里斯托夫G.陈J.郭J.A.马特鲁尼奇
Owner ETHICON INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products