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Multi-structure coupling magnetic field adaptability type rotating arc ion plating device

A magnetic field generator, multi-structure technology, applied in ion implantation plating, sputtering plating, vacuum evaporation plating, etc., can solve the problem of target etching and poor coating uniformity, affecting the performance and life of coatings and films , Low target utilization rate, etc.

Active Publication Date: 2014-07-09
温州驰诚真空机械有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to provide a multi-structure coupling magnetic field adaptive rotating arc ion plating device, which solves the problem that the existence of large particles seriously affects the performance and life of coatings and films, poor target etching and coating uniformity, etc. Problems such as low target utilization and low deposition efficiency

Method used

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  • Multi-structure coupling magnetic field adaptability type rotating arc ion plating device
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  • Multi-structure coupling magnetic field adaptability type rotating arc ion plating device

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Embodiment 1

[0050] figure 1 It is one of the two-dimensional structural schematic diagrams of a multi-structure coupling magnetic field adaptive rotating arc ion plating device assisted by a single-two-pole rotating transverse magnetic field in Embodiment 1 of the present invention. The two-pole rotating transverse magnetic field generating device and the target are close to the end of the flange. figure 2 It is the second schematic diagram of the two-dimensional structure of a multi-structure coupling magnetic field adaptive rotating arc ion plating device assisted by a single-two-pole rotating transverse magnetic field in Embodiment 1 of the present invention. The two-pole rotating transverse magnetic field generator and the target are close to the bottom of the flange. It can be seen from the figure that the single-type composite magnetic field-assisted ion plating arc source device assisted by a single-two-pole rotating transverse magnetic field adopts a compact, simple and adjustable...

Embodiment 2

[0068] From image 3 It can be seen that when other magnetic fields do not work, the two-pole transverse magnetic field on the surface of the target is completely parallel to the target surface, forming an acute angle with the edge of the target pointing to the inside of the target. The high-speed rotation of the two-pole transverse rotating magnetic field can make the arc spot uniformly discharge on the entire target surface, reduce the power density, and reduce the emission of large particles. Because the transverse magnetic field is easy to make the arc spot move in a straight line at high speed, and the rotating transverse magnetic field can make the arc spot cloth run out of the target surface and distribute in the target surface, but if the rotation frequency and the magnetic field strength do not match, the transverse magnetic field with too large strength can be used alone It is easy to cause arc running and weaken the stability of arc spot discharge. However, the pre...

Embodiment 3

[0071] The transverse magnetic field has the effect of confining the plasma, which greatly reduces the transmission efficiency of the arc plasma. Most of the plasma is confined near the target surface, resulting in uneven deposition and a decrease in the rate. In order to further improve the transmission efficiency of the plasma, this Embodiment 3 of the invention extracts the purified high-density plasma through the focusing and guiding magnetic field at the end of the flange. Figure 6 It is the multi-structure coupling magnetic field adaptable rotating arc ion plating of the embodiment 3 of the present invention that the coupling magnetic field structure is a two-pole rotating transverse magnetic field coupled with a flange end focusing and guiding magnetic field (with a yoke) 27 of a certain strength to form a two-type composite magnetic field. Schematic diagram of the two-dimensional structure of the device. The focusing and guiding magnetic field generator 28 is composed...

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Abstract

The invention relates to the technical field of thin film and coating preparation, in particular to a multi-structure coupling magnetic field adaptability type rotating arc ion plating device and solves the problems that in prior art, large particles exist, target material etching and coating uniformity are poor, the deposition efficiency is low, and the like. According to the rotating arc ion plating device, a special multi-function multi-structure adaptability type ion plating gun is matched with a structurally optimized water-cooling flange sleeve to serve as an entire arc source structure, an axial auxiliary magnetic field device is arranged in the rear of a target material base of the ion plating gun, a secondary rotating transverse magnetic field generator and a focusing guide magnetic field device are arranged on the outer side of the flange sleeve, a poly-type composite magnetic field with a secondary rotating transverse magnetic field as a master and other coupled magnetic fields is formed under the action of coupling of three magnetic field devices, requirements of rotating magnetic field states nearby a target surface can be met, the arc spot electro-discharge mode is improved, the power density is reduced, large particle emission is reduced, the magnetic field distribution of plasma conveying space can be guaranteed, and plasma conveying efficiency and uniformity are improved.

Description

technical field [0001] The invention relates to the technical field of thin film and coating preparation, in particular to a multi-structure coupled magnetic field adaptive rotary arc ion plating device. Background technique [0002] Surface protective coating technology is an important way to improve the quality and service life of tools, molds and mechanical parts. As one of the material surface protection technologies, ion coating technology can be easily obtained due to its simple structure, high ionization rate, and high incident particle energy. Ceramic coatings and composite coatings with high hardness and high wear resistance, which are difficult to obtain by other methods, can be applied to tools and molds, which can double the service life and achieve low-cost and high-yield effects; in addition, Ion plating coating technology has two characteristics of low temperature and high energy. It can form a film on almost any substrate. It has a wide range of applications ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 郎文昌王向红李明霞
Owner 温州驰诚真空机械有限公司
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