Device and method for adjusting uniformity of vacuum magnetic control glow

Abstract

The invention relates to a device and a method for adjusting uniformity of a vacuum magnetic control glow. The device comprises a length regulating mechanism, a glow uniformity control mechanism and a glow homogenizing mechanism, wherein the length regulating mechanism is matched with the glow uniformity control mechanism so as to control the glow homogenizing mechanism to adjust the uniformity of the glow. The method comprises the following steps of firstly, measuring uniformity of a spluttering product and judging spluttering intensity of each position; secondly, adjusting length of an adjusting rod according to the spluttering intensity position by the adjusting rod so as to locate a baffle to be adjusted, rotating to drive a baffle nail to move, controlling the opening size of the baffle at the position, producing the spluttering product and measuring the uniformity, and repeating the steps until the uniformity reaches production requirements. The device and the method provided by the invention have the advantages that the device and the method can be operated under vacuum condition without an air return operation, the cost is reduced, and the manpower and material resources are saved; and the glow uniformity can be precisely adjusted.

Description

technical field [0001] The invention relates to the technical field of glass deep processing, in particular to a device and method for adjusting vacuum magnetron glow uniformity. Background technique [0002] Since the 1990s, the application of magnetron sputtering technology has become more and more extensive, and it has played a huge role in the fields of industrial production and scientific research. As a very effective thin film deposition method, magnetron sputtering technology has been widely and successfully applied in many fields, especially in the fields of optical thin film, microelectronics, and material surface treatment, for thin film deposition and surface coating preparation. [0003] The uniformity of the thickness of the film produced by magnetron sputtering is an important indicator of the film-forming properties. The thickness of the coating layer cannot be ideally evenly distributed. [0004] The Chinese patent with the patent number CN201120282981.5 di...

AI Technical Summary

Problems solved by technology

[0005] 1. The purpose of adjustment is poor, and it is completed by multiple operating experience

[0006] 2. The adjustment is not very targeted, and it cannot be adjusted for a certain cavity from time to time

[0007] 3. The adjustment accuracy is poor, and there is no quantitative adjustment device, so its practicability is poor

[0008] 4. The operation performance is not good. This technology can only be operated in the atmospheric environment, which seriously affects the normal industrial production.

Images