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Optical measuring apparatus and optical measuring method

A technology of optical measurement and optical system, applied in the direction of measurement device, optical device, color/spectral characteristic measurement, etc.

Inactive Publication Date: 2012-07-11
HORIBA LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Furthermore, conventionally, as shown in Patent Document 3 (Japanese Patent Laid-Open Publication No. 2006-214935), although an integrating sphere was also used to measure film thickness, this example was not used to measure haze.

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  • Optical measuring apparatus and optical measuring method
  • Optical measuring apparatus and optical measuring method
  • Optical measuring apparatus and optical measuring method

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Embodiment Construction

[0044] Hereinafter, an embodiment using a spectrum analyzer as an example of the optical measurement device of the present invention will be described with reference to the drawings.

[0045]For example, in a glass substrate or a semiconductor substrate having a transparent conductive film (such as a TCO film) constituting a solar panel or the like, the spectrum analyzer 100 of this embodiment is used to measure the transmission and reflection characteristics of the transparent conductive film.

[0046] Specific as figure 1 As shown, the spectrum analysis device 100 includes: an integrating sphere 2, which is arranged on the upper part of the sample W; a reflection measurement optical system 3, which irradiates the sample W with light L1 for reflection measurement; a transmission measurement optical system 4, which irradiates the sample W The light L2 for transmission measurement; the reflective member 5; the moving mechanism 6 for moving the reflective member 5; and the detec...

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Abstract

The present invention provides an optical measuring apparatus and an optical measuring method, which can not only measure (calculate) the full reflected light of a sample, but also independently measure (calculate) reflection characteristics such as scattered reflected light and reflection haze degree, etc., and also can calculate the film thickness of the sample through using the characteristics. The optical measuring apparatus comprises a first reflected light measuring optical system (3) performing light condensing on the full reflected light using an integrating sphere (2); a second reflected light measuring optical system (3) performing light condensing on the scattered reflected light using the integrating sphere (2); and a detection optical system (7) performing detection on condensed light using the integrating sphere (2). Based on the full reflected light obtained through the first refelction light measuring optical system (3) and the detection optical system (7) and the scattered reflected light obtained through a second reflected light measuring optical system (3) and the detection optical system (7), the haze degree is calculated, and the film thickness of the sample is calculated according to the full reflected light.

Description

technical field [0001] The present invention relates to an optical measurement device such as a spectrum analysis device and an optical measurement method. Background technique [0002] Conventionally, optical characteristic measuring devices using an integrating sphere include reflection type and transmission type. Furthermore, as shown in Patent Documents 1 and 2, by combining reflection-type and transmission-type optical characteristic measuring devices, it is possible to measure the reflection characteristics and transmission characteristics of a sample with one optical characteristic measuring device. [0003] In the optical characteristic measuring device disclosed in Patent Document 1 (Japanese Patent Laid-Open Publication No. 2002-243550), a first opening, a second opening, and a third opening are provided on the integrating sphere. When measuring reflection characteristics, a sample is placed on the first opening, and reflected light and scattered light are receive...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/55G01N21/59G01N21/25G01B11/06G01N21/47
Inventor 濱田基明
Owner HORIBA LTD
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