Method using gamma radiation for preparing nano-silver surface-enhanced Raman spectrum substrate
A surface-enhanced Raman and nano-silver technology, applied in the process of producing decorative surface effects, Raman scattering, and manufacturing microstructure devices, etc., can solve the problems of poor signal uniformity, complex preparation process, low sensitivity, etc. The effect of strong Raman signal, high detection sensitivity and low price
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
specific Embodiment approach 1
[0012] Specific embodiment one: the method for preparing nano-silver surface-enhanced Raman spectrum substrate by gamma radiation in this embodiment is carried out according to the following steps:
[0013] Step 1. Soak the glass substrate in lye solution at 55-65°C for 0.5-1h, then wash it with distilled water, then soak it in nitric acid solution for 0.5h, then wash it with distilled water, and ultrasonically wash it with absolute ethanol for 0.5-1h , placed in absolute ethanol for subsequent use;
[0014] Step 2, adding free radical scavenger in the silver nitrate solution, the volume of free radical scavenger is 10% of the silver nitrate solution volume, feeds nitrogen after 30min (object is to remove the dissolved oxygen in the solution), obtains radiation solution;
[0015] Step 3, put the glass substrate cleaned in step 1 into a radiation solution, seal it, and irradiate gamma rays for 4 to 8 hours under the condition of an irradiation dose of 10 kGy, to obtain a nano-s...
specific Embodiment approach 2
[0017] Embodiment 2: This embodiment differs from Embodiment 1 in that: the lye in Step 1 is an aqueous NaOH solution with a concentration of 0.2-0.5 mol / L. Other steps and parameters are the same as in the first embodiment.
specific Embodiment approach 3
[0018] Embodiment 3: This embodiment differs from Embodiment 1 or Embodiment 2 in that: the concentration of the nitric acid solution in step 1 is 0.05-1 mol / L. Other steps and parameters are the same as those in Embodiment 1 or Embodiment 2.
PUM
Property | Measurement | Unit |
---|---|---|
Particle size | aaaaa | aaaaa |
Particle size | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com