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Design method for high-efficiency metal dielectric reflection grating

A technology of dielectric reflection and design method, applied in the field of reflection grating, can solve problems such as design methods that have not yet been seen, and achieve the effect of clear physical concept

Active Publication Date: 2012-06-13
杭州光学精密机械研究所
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, for the design of reflective gratings, there is no simplified design method

Method used

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  • Design method for high-efficiency metal dielectric reflection grating
  • Design method for high-efficiency metal dielectric reflection grating
  • Design method for high-efficiency metal dielectric reflection grating

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Embodiment 1

[0059] The design is suitable for a -1 level high-efficiency metal dielectric reflection grating with a wavelength of 800 nm. Its structure is that a 145 nm chromium film 3, a 150 nm gold film 2 and a fused silica film 1 are sequentially coated on a fused silica substrate 4, and the fused silica Layer 1 etches a grating of rectangular grooves. The duty cycle of the grating is 0.5, and the effective refractive index n of the 0-mode and 1-mode modes is calculated according to formula (1) 0eff and n 1eff , calculate the depth hr of the grating according to formula (5), and calculate the thickness h of the connection layer according to formula (8) c , considering the coating process, the value of l in the formula (5) and p in the formula (8) should not be too large, here l=0, p=1. The -1st order diffraction efficiency η of the corresponding grating is calculated using the strict coupled wave algorithm -1 .

[0060] Table 1 provides an embodiment of the present invention, where...

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Abstract

The invention provides a design method for a high-efficiency metal dielectric reflection grating. The metal dielectric reflection grating adopts the structure that a chromium film, a gold film and a fused silica film are sequentially plated on a fused silica substrate, and rectangular slotted gratings are etched on the fused silica film. The metal dielectric reflection grating is divided into a top transmission grating and a high-reflectance reflector consisting of a connecting layer, a metal layer and a base layer. The duty cycle required for calculating both the depth of the top grating and the wideband high efficiency is provided by a simplified mode method. The thickness of the connecting layer is selected according to the interference principle, so as to realize maximum reflectance of the reflector. The method has the advantages of distinct physical images, simplicity and applicability, and plays a guidance role on the design of both a -1-grade high-efficiency metal dielectric reflection grating and a multi-layer dielectric film reflection grating.

Description

technical field [0001] The invention relates to a reflective grating, in particular to a design method of a high-efficiency metal-dielectric reflective grating working at the Littrow angle-1 level. Background technique [0002] In chirped pulse amplification technology, reflective gratings with wide spectrum, high efficiency, and high laser damage threshold are required. Reflective gratings such as metal gratings, multilayer dielectric gratings, and metal dielectric gratings can all achieve high diffraction efficiency. However, although metal gratings can achieve high efficiency in a wide spectral range, the inherent absorption characteristics of metals make their laser destruction thresholds relatively low, so they are not suitable for high-energy laser systems. From a structural point of view, the multilayer dielectric film grating and the metal dielectric grating are etched grating grooves on the top dielectric layer, and the incident light is diffracted by the etched gr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G02B27/00
Inventor 周常河胡安铎
Owner 杭州光学精密机械研究所
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