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Three-phase dry type magnetic voltage regulator driver for driving cathodic power supply for processing niobium-silicon alloy

A driving device and voltage regulator technology, which is applied in the direction of instruments, electric variable adjustment, control/regulation system, etc., can solve problems such as electron beam current fluctuation, influence on electron beam processing, and unstable output power of cathode power supply, etc., to achieve suppression Influence, improve signal drive capability, smooth and controllable load stepless voltage regulation effect

Active Publication Date: 2013-06-05
成都航大新材料有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to improve the existing electron beam exposure system when processing niobium-silicon alloys, the output power of the cathode power supply is unstable, which easily causes fluctuations in the electron beam current, thereby affecting the defects of electron beam processing. The present invention designs a device for driving and processing niobium Three-phase dry-type magnetic voltage regulator drive device for cathode power supply of silicon alloy

Method used

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  • Three-phase dry type magnetic voltage regulator driver for driving cathodic power supply for processing niobium-silicon alloy
  • Three-phase dry type magnetic voltage regulator driver for driving cathodic power supply for processing niobium-silicon alloy

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Embodiment Construction

[0031] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0032] see figure 1 As shown, a kind of three-phase dry-type magnetic voltage regulator driving device for driving the cathode power supply of niobium-silicon alloy of the present invention, the driving device includes:

[0033] A reference control voltage signal module

[0034] The reference control voltage signal module is used to obtain the required standard voltage signal V 标准 , the voltage value of the reference voltage is adjusted as required by the Zener tube DW2.

[0035] A Control Voltage Operational Amplifier Module

[0036] The control voltage op amp module is used for the standard voltage signal V 标准 Perform inverting amplification to obtain the required inverting voltage signal V 反 .

[0037] A control voltage limiter

[0038] The control voltage limiter is used to control the inverting voltage signal V 反 Amplitude, to avoid excessive vo...

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Abstract

The invention discloses a three-phase dry type magnetic voltage regulator driver for driving a cathodic power supply for processing niobium-silicon alloy. The driver utilizes a reference control voltage signal module to generate needed standard voltage signals and carries out reversed-phase amplification through a control voltage operational amplifier module. After amplitude is regulated by a control voltage regulation potentiometer, a driving operational amplifier carries out operational processing and power amplification on the regulated voltage signal and a current feedback signal to driveand control a driving power amplifier. By controlling the current magnitude of a voltage regulator coil, the driving power amplifier changes the magnetic flux of a three-phase dry type transformer inorder to regulate the output power of the cathodic power supply. An experiment indicates that the three-phase dry type magnetic voltage regulator driver for driving the cathodic power supply for processing niobium-silicon alloy can ensure the output of the cathodic power supply to have a smooth controllable on-load stepless voltage regulation characteristic; and has the advantages of reliable operation and low high-frequency noise.

Description

technical field [0001] The present invention relates to a cathode power supply for target material processing using an electron beam exposure machine, more particularly, a three-phase dry magnetic voltage regulator driving device for driving the cathode power supply for processing niobium-silicon alloys. Background technique [0002] Electron beam exposure system is a high-performance complex system integrating electron optics, precision machinery, automatic control, ultra-high vacuum and other technologies. It has many types of controlled quantities, wide control range and high precision requirements. Therefore, it requires the control computer to have the functions of storing a large amount of graphic data, real-time response, high reliability, continuous and stable work for a long time, and realizing comprehensive control. [0003] In the book "Electron Beam Exposure Micro-Nano Processing Technology" edited by Gu Wenqi, "Chapter 2 Electron Optical System in Electron Beam ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05F1/56
Inventor 张虎孙井永
Owner 成都航大新材料有限公司
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