Diffusion flow equalizing plate used for horizontal diffusion furnace

A technology of diffusion furnace and equalizing plate, applied in the directions of diffusion/doping, crystal growth, electrical components, etc., to achieve the effect of uniform reaction

Inactive Publication Date: 2011-11-16
SHANGHAI SHENZHOU NEW ENERGY DEV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the uniform flow plate of this structure, the uniformity of the diffusion process can only be maintained within the fluctuation range of ±5% within the sheet and ±8% between the sheets.

Method used

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  • Diffusion flow equalizing plate used for horizontal diffusion furnace
  • Diffusion flow equalizing plate used for horizontal diffusion furnace
  • Diffusion flow equalizing plate used for horizontal diffusion furnace

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Embodiment Construction

[0011] see figure 2 , the present invention is used for the diffusion equalizer of the horizontal diffusion furnace, including the inlet pipe 1, the outlet pipe 2 and a plurality of connecting pipes 5 connected between the inlet pipe and the outlet pipe, wherein the connecting pipes 5 are hollow bellows connecting pipe. A plurality of protruding rings 51 are arranged at intervals on the hollow bellows-shaped connecting pipe 5 , so that the connecting pipe forms a corrugated structure with concavo-convex connected at intervals along the axial direction.

[0012] Diffusion share plate for horizontal diffusion furnace using the present invention, POCl 3 The gas passes through the corrugated passages 6 between the connecting pipes 5 and enters the diffusion furnace. The uniformity of the diffusion process is greatly improved, and the uniformity of the diffusion process can be improved to a fluctuation range of ±3%. , The uniformity between slices is improved to a fluctuation ra...

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Abstract

The invention provides a diffusion flow equalizing plate used for a horizontal diffusion furnace. The diffusion flow equalizing plate comprises an inlet tube, an outlet tube and multiple communicating tubes connected between the inlet tube and the outlet tube, wherein the communicating tubes are in the shape of a hollow corrugated tube. By using the diffusion flow equalizing plate used for the horizontal diffusion furnace provided by the invention, POCl3 gas can pass more evenly, the intra-wafer uniformity of a diffusion process is increased to be within a fluctuation range of + / -3% and the inter-wafer uniformity is increased to be within a fluctuation range of + / -5%, so that POCl3 gas can react with the silicon wafer more evenly.

Description

technical field [0001] The invention relates to an equipment component in the solar cell manufacturing process, in particular to a diffusion equalizer plate used in a horizontal diffusion furnace. Background technique [0002] As an emerging clean and renewable energy source, solar cells have attracted much attention due to their advantages of directly converting solar energy into electrical energy, long life, simple maintenance, and unattended operation. Solar power systems have been used more and more widely. [0003] Diffusion technology is an important process in the preparation of conventional solar cells. At present, in mass production, horizontal diffusion furnaces are generally used. The working principle is that, at high temperatures, by introducing liquid POCl 3 , A replacement reaction occurs with the silicon wafer, thereby diffusing on the silicon wafer to form a layer of P, forming a PN junction. [0004] Liquid POCl 3 by N 2 The pipeline is led into the dif...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B31/04H01L31/18
CPCY02P70/50
Inventor 张忠卫
Owner SHANGHAI SHENZHOU NEW ENERGY DEV
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