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Alignment loading device used for stretching test of nanoscale, micron-size thin film materials

A thin film material, tensile testing technology, used in measuring devices, analyzing materials, using stable tension/pressure to test the strength of materials, etc. Structural space size, compact structure

Inactive Publication Date: 2012-10-03
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Atomic force microscopy (AFM) is mostly a type of probe movement. The adjustment of the observation field position is achieved by adjusting the bias voltage of the piezoelectric crystal in the probe, thereby driving the needle tip to move. This is equivalent to the position of the needle tip according to a downward direction. Convex surface adjustment, so the range of horizontal adjustment of the field of view is limited. For a type of AFM where the bottom specimen moves, the position adjustment is also realized through the piezoelectric crystal in the base, and the adjustment range is also limited.

Method used

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  • Alignment loading device used for stretching test of nanoscale, micron-size thin film materials
  • Alignment loading device used for stretching test of nanoscale, micron-size thin film materials
  • Alignment loading device used for stretching test of nanoscale, micron-size thin film materials

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Embodiment

[0023] A centering loading device for tensile testing of nano- and micron-scale film materials, consisting of a reverse thread centering loading frame and a compliant hinge loading sensing component; the reverse thread centering loading frame includes a bottom plate 1, two vertical Plates 2-I, 2-II, two guide rods 3-I, 3-II, two slide plates 4-I, 4-II, two guide groove blocks 5-I, 5-II, adjusting screw 6 and Handwheel 7, two vertical plates 2-I, 2-II and bottom plate 1 are fixed to form a concave frame, two vertical plates 2-I, 2-II are respectively provided with a center hole and bearings, and two guide rods 3 -I and 3-II are located on both sides of the concave frame and are respectively fixed to two vertical plates 2-I and 2-II, and the two sliding plates 4-I and 4-II are both in the shape of a "T" and are set opposite to each other. 4-Ⅰ, 4-Ⅱ are provided with two circular holes and a central screw hole, the two circular holes are slidingly matched with the two guide rods 3...

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Abstract

The invention relates to an alignment loading device used for stretching test of nanoscale, micron-size thin film materials, which comprises a reverse thread alignment loading framework and a flexible hinge loading sensing parts; the reverse thread alignment loading framework comprises a base plate, two vertical plates, two guide bars, two slide plates, two guide groove blocks, an adjusting leading screw and a handwheel, a left-right turning screw rod thread is arranged on the adjusting leading screw between the two vertical plates, central leading screw apertures on two slide plates are respectively cooperated with the left-right turning screw rod thread on the adjusting leading screw and perform a synchronous relative movement along two guide bars; the flexible hinge loading sensing part has an integral type framework structure, wherein two S-shaped sensing parts used for pasting foil gauges are symmetrically arranged in the central part. The invention has the advantages of compact structure and small size, and is suitable for directly observing and measuring under a microscope; the flexible hinge is connected with the framework structure by integrating with a sensor, which can improve the measure precision, as well as measure and evaluate the interface combination performance of the nanoscale, micron-size thin film substrate structure test piece and tensile fracture performance of the films.

Description

technical field [0001] The invention relates to a device for testing mechanical properties of nano-micro and meter-level materials, in particular to a centering loading device for tensile testing of nano- and micron-level film materials. Background technique [0002] Nanotechnology is a new science developed from the late 1980s and early 1990s. It has attracted great attention both at home and abroad, especially in nanomaterials. The significance of nanotechnology will first of all promote the revolution of human cognition, and at the same time trigger a new industrial revolution, which will have a major impact on our country's society, economy and national security. [0003] The design, development and performance research of nanomaterials are the basis of high-tech development. Mechanical and thermal properties are the main indicators to evaluate the quality of nanomaterials, and also the main basis for the design and calculation of nanostructures. In recent years, with ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N3/02G01N3/08
Inventor 门玉涛王世斌李林安
Owner TIANJIN UNIV
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