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Device and method for realizing alignment-deviation measurement in photoetching technology

A technology of alignment deviation and photolithography, which is applied in the photomechanical process of photomechanical processing of originals, optics, and pattern surfaces, and can solve the problems of difficult reading of photolithography vernier scales.

Active Publication Date: 2011-06-29
FOUNDER MICROELECTRONICS INT
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Problems solved by technology

[0011] The invention provides a device and method for measuring alignment deviation in lithography technology, which is used to overcome the problem of difficult reading of lithography vernier in the prior art

Method used

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  • Device and method for realizing alignment-deviation measurement in photoetching technology
  • Device and method for realizing alignment-deviation measurement in photoetching technology
  • Device and method for realizing alignment-deviation measurement in photoetching technology

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Embodiment Construction

[0043] An embodiment of the present invention provides a method for generating a photolithography vernier, the method comprising: arranging a plurality of short teeth of the vernier in the pattern of the first layer of photoresist, and the short teeth of the vernier are arranged at equal intervals; A plurality of long teeth of the vernier ruler are set in the stereotype pattern, and the long teeth are arranged at equal intervals; when the first layer of photoresist pattern and the second layer of photoresist pattern overlap, the long ruler teeth and short ruler teeth are arranged alternately, and the short ruler teeth The width of the tooth is equal to the distance between two adjacent long chi teeth; the long chi teeth in the center of the long chi teeth are taken as the origin, and the long chi teeth at the positive and negative ends of the origin move corresponding distances to the two ends respectively with the origin as the center, and the long chi teeth The tooth and the ...

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Abstract

The invention discloses a method for realizing alignment-deviation measurement in photoetching technology and a photoetching vernier, applied to the technical field of photoetching, wherein the photoetching vernier comprises: short teeth of a plurality of verniers are arranged in a first layer of photoetching-plate patterns; the short teeth are equidistantly arranged; long teeth of a plurality of verniers are arranged in a second layer of photoetching-plate patterns; the long teeth and the short teeth are staggered; a median tooth of the long teeth is used as an original point; the distance of the long teeth between positive and negative ends of the original point and the original point is the sum of a product which is obtained by multiplying an absolute value of the coordinate of the long teeth by twice resolution ratio of the vernier, and the value of the original distance between the long teeth to the original point; the long teeth and the short teeth form a vernier, wherein the original distance is the sum of the width values of the long and short teeth between the long teeth and the original point. Via the method and the device provided by the embodiment of the invention, the problem that the photoetching vernier in the priort art is difficult for reading the value is solved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a device and a method for realizing alignment deviation measurement in the photolithographic technology in the field of photolithographic technology in the manufacture of semiconductor devices. Background technique [0002] The manufacturing process of semiconductor devices includes several times, dozens of times or even dozens of photolithography (in the industry, it is customary to refer to "one-time" photolithography as "one layer"), and the alignment accuracy between layers is very important. The vernier is a tool for detecting alignment accuracy (alignment deviation) between layers. [0003] like figure 1 As shown, the design method of the traditional vernier ruler: one wide and one narrow two sets of ruler teeth are respectively designed in two layers of photolithographic plate graphics, overlapping each other and arranged in pairs to form a figure 2 ...

Claims

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Application Information

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IPC IPC(8): G03F1/00G01B3/18G03F1/42
Inventor 潘光燃马万里张立荣
Owner FOUNDER MICROELECTRONICS INT
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