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Substrate processing equipment and thimble lifting device thereof

A technology of substrate processing equipment and lifting device, which is applied in the directions of transportation and packaging, conveyor objects, electrical components, etc., can solve the problems of increasing the difficulty of processing and assembly, increasing the average maintenance time, and narrowing the adjustment range, and achieves leveling The process is simple and convenient, the average maintenance time is reduced, and the effect of expanding the leveling range

Active Publication Date: 2012-09-05
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the adjustment range of the first adjustment screw 183 and the second adjustment screw 184 is relatively small. If the adjustment range is exceeded, the horizontal adjustment cannot be realized, which increases the processing and assembly precision requirements of each part and increases the processing and assembly costs. Difficulty; and, after replacing a certain part in the device, it is necessary to re-level the whole device, which increases the average maintenance time; in addition, the device is located in the lower part of the reaction chamber, with a metal box outside, and the whole device needs to be leveled during leveling. Dismantling, time-consuming and labor-intensive

Method used

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  • Substrate processing equipment and thimble lifting device thereof
  • Substrate processing equipment and thimble lifting device thereof
  • Substrate processing equipment and thimble lifting device thereof

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Embodiment Construction

[0026] The core of the present invention is to provide a thimble lifting device, which has a large leveling range, thereby reducing the requirements for parts processing and assembly precision, and the leveling process is more convenient, and the average maintenance time can be shortened. Another core of the present invention is to provide a substrate processing equipment including the above-mentioned ejector pin lifting device.

[0027] In order to enable those skilled in the art to better understand the solution of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0028] Please refer to figure 2 , figure 2 It is a structural schematic diagram of a specific embodiment of the thimble lifting device provided by the present invention.

[0029] In a specific embodiment, the thimble lifting device provided by the present invention includes a cylinder 27 located at the...

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Abstract

The invention discloses a thimble lifting device used for substrate processing equipment, comprising a fixation seat supporting a thimble; a positioning rod penetrates through the middle part of the fixation seat along the vertical direction; a radial clearance is arranged between the positioning rod and the fixation seat; the tail end of the positioning rod is fixedly connected with a corrugatedpipe assembly; the fixation seat is evenly provided with two through holes with inner threads along a circumferential direction; a regulation screw is matched with the through hole through the thread; the lower end of the regulation screw is supported on the upper surface of the corrugated pipe assembly, thus the device can be leveled only by adjusting the regulation screw; the levelling process is simple and convenient, thus effectively shortening mean maintenance time of the device, improving the levelling range of the device, lowering the requirements of the processing and assembling precision of each component in the device, and saving the production cost. The invention also discloses the substrate processing equipment.

Description

technical field [0001] The invention relates to the field of semiconductor processing, in particular to a thimble lifting device. The present invention also relates to a substrate processing equipment comprising the above ejector pin lifting device. Background technique [0002] With the rapid development of my country's economic construction, the market demand for semiconductor components is increasing, which has led to the rapid development of the semiconductor processing industry. [0003] At present, the interior of the process chamber for processing semiconductors generally has an electrostatic chuck, which is used to support semiconductor components such as crystals to be processed, and its lower part is provided with a lifting device. Thimble, the number of thimbles is generally four. When processing crystals, the transfer platform transfers the crystals into the process chamber, and makes the crystals a certain distance above the upper surface of the electrostatic ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683H01L21/677H01L21/00
Inventor 管长乐
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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