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Dense homogeneous fluoride films for DUV elements and method of preparing same

A fluoride, optical element technology, applied in optical elements, instruments, vacuum evaporation coating, etc., can solve the problems of surface/interface roughness and non-uniformity increase

Active Publication Date: 2013-01-30
CORNING INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, as the number of layers increases and the total thickness increases, the surface / interface roughness and inhomogeneity increase

Method used

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  • Dense homogeneous fluoride films for DUV elements and method of preparing same
  • Dense homogeneous fluoride films for DUV elements and method of preparing same
  • Dense homogeneous fluoride films for DUV elements and method of preparing same

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Embodiment Construction

[0032] The present invention relates to optical elements (also referred to as substrates) coated with dense uniform fluoride films, and to methods of making such coated elements. The coating is a high ("H") index fluoride material and a low ("L") index material that co-evaporate to form a coating of L-H mixture (L-H layer, coating of co-deposited L and H materials). Fluorides of lanthanide metals (such as neodymium, lanthanum, dysprosium, yttrium, and gadolinium, and combinations thereof) are preferred metal fluorides for high refractive index materials, lanthanum fluoride (LaF 3 ) and gadolinium fluoride (GdF 3 ) is particularly preferred. Aluminum fluoride (AlF 3 ) and alkaline earth metal fluorides (calcium, magnesium, barium and strontium fluorides) are preferred low refractive index materials, magnesium fluoride (MgF 2 ) is the preferred alkaline earth metal fluoride. High refractive index materials have a refractive index of 1.55-1.75. The low refractive index mater...

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Abstract

The present invention relates to an optical element coated with a dense uniform fluoride film, further to a method of manufacturing such coated elements. The coating is a coating that co-evaporates to form a coating of L-H coating with a high ("H") refractive index fluoride material and a low ( "L") refractive index material (a coating of L and H materials co-deposited). Lanthanides (e.g., neodymium, lanthanum, dysprosium, yttrium and gadolinium, and combinations thereof) are preferred metal fluorides used as high refractive index materials, especially preferably lanthanum fluoride (LaF 3 and gadolinium fluoride (GdF 3 )。 Aluminium fluoride (AlF 3 and alkaline earth metal fluoride (calcium, magnesium, barium and strontium fluoride) is preferred low refractive index material, magnesium fluoride (MgF 2 ) is preferred alkaline earth metal fluoride.

Description

[0001] Related Application Cross Reference [0002] This application claims priority under 35 U.S.C. §119(e) to U.S. Provisional Application Serial No. 61 / 004784, filed November 30, 2007. technical field [0003] The present invention relates to coated surfaces and components, such as mirrors for use in laser systems, and in particular to coatings for sub-200 nm laser systems such as Component surface of an ArF laser. Background technique [0004] ArF excimer lasers based on microlithography have been widely used by the semiconductor industry for mass production of patterned silicon wafers. The industry continues to demand higher performance from excimer laser sources. Therefore, higher requirements are continuously put forward for the optical components of the excimer laser, for example, the high reflection mirror used in the high repetition rate excimer laser with a wavelength of 193 nm. [0005] As semiconductor processing has progressed from 65nm to the 45nm node and ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/11G02B5/28G02B5/08C23C14/00
CPCG02B5/283C23C14/24G02B1/115C23C14/06G02B5/0833G02B5/0891G02B5/285
Inventor M·J·康杰米H·施赖伯王珏
Owner CORNING INC
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