Twin-fluid nozzle for cleaning substrate

Abstract

The invention discloses a double-fluid nozzle for substrate cleaning, the nozzle comprises: a first accommodation section and a second accommodation section for respectively accommodating mutually distinct fluids; a first channel for transferring a first fluid accommodated in the first accommodation section, a first jet orifice for jetting the first fluid is formed at one end thereof; a second channel for transferring second fluid accommodated in the second accommodation section, a second jet orifice for jetting the second fluid is formed at one end thereof; a double-fluid drainage section for draining the double-fluid which is generated by mixing the fluids jetted from the first and the second jet orifices; and a guide section formed at a front end of the second jet orifice and for guiding the jetting direction of the second fluid jetted from the second jet orifice to the first jet orifice. In accordance with the invention, the micronic and uniform double-fluid is generated by mixing the dry air with a washing liquid that is smashed to ultramicronic droplets, so as to prominently improve washing efficiency for the substrate.

Description

technical field [0001] The invention relates to a two-fluid nozzle for substrate cleaning, in particular to a two-fluid nozzle for substrate cleaning which mixes and amplifies two fluids and sprays them onto the substrate surface. Background technique [0002] Usually, substrates used on flat panel displays (FPD: Flat Panel Display) such as semiconductor wafers or TFT-LCD (Thin Film Transistor-Liquid Crystal Display), PDP (Plasma Display Panel) and EL (Electro Luminescence) displays require high-precision processing It is particularly important to prevent defects during its manufacturing process. Moreover, with the development of larger screens today, the size of the substrates to be processed in the flat panel display manufacturing process also tends to be larger. In order to reduce the cost of manufacturing flat panel displays using such large-area substrates, research to minimize the defect rate in the manufacturing process is actively being conducted. [0003] In addit...

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Problems solved by technology

[0008] However, the existing two-fluid nozzle adopts the method of supplying the cleaning liquid and the drying air to the inside of the main body 10 and then simply mixing them, so that the two-fluid droplets of uniform size cannot be generated, thus reducing the cleaning efficiency.

In particular, a large number of air bubbles are generated due to the stagnation of the two-fluid at the portion where the transfer channel 13 is bent at a right angle, so that the size of the two-fluid droplet cannot be sufficiently atomized, so that the existing two-fluid nozzle is not enough for fine particles. cleaning process

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