Lift mechanism systems and methods

A technology of balance mechanism and structure, which is applied in the direction of supporting machines, mechanical equipment, machine platforms/supports, etc. It can solve the problems of gas leakage, expensive gas springs, and a large amount of space for gas springs, and achieve high reliability and low cost.

Active Publication Date: 2009-02-18
ERGOTRON
View PDF1 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, gas springs are very expensive and over time, gas can leak
Also, gas springs require a lot of space, e.g. the length of the arm, which can be an additional expense in some applications, e.g. in hospitals

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Lift mechanism systems and methods
  • Lift mechanism systems and methods
  • Lift mechanism systems and methods

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0055] The following detailed description should be read with reference to the drawings, in which like elements are denoted by like reference numerals in different drawings. The drawings illustrate selected embodiments and are not intended to limit the scope of the invention and are not necessarily to scale. Examples of constructions, materials, dimensions and manufacturing methods are provided for selected elements. All other elements use those techniques known to those of ordinary skill in the art. Those of ordinary skill in the art will recognize that many of the examples provided have suitable alternatives that may be used.

[0056] FIG. 1 is a front view of an apparatus 100 according to an exemplary embodiment of the present invention. The apparatus 100 of FIG. 1 includes a first slide 102 , a second slide 104 and a balancing mechanism 106 . The first slide arrangement 102 includes a first inner rail 108 and a first outer rail 120 arranged in sliding engagement with ea...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention includes a display positioning assembly comprising a support, a display supported by the support, and a balance mechanism carried by the display and operatively connected to the support. The invention also includes an article for selectively exposing a display comprising a generally planar support surface having a first side and a second side opposite the first side. A balance mechanism operatively connected to a display may be positionable between a storage position proximate the first side of the generally planar support surface and an exposed position proximate the second side of the generally planar support surface. The invention also includes an assembly for arresting the free fall of an object. The assembly may comprise an outer slide in sliding or rolling engagement with an inner slide, and a brake comprising at least one pivot member may be coupled to the inner slide.

Description

technical field [0001] The present invention generally relates to an apparatus for supporting a load in a vertical or horizontal or other direction or for providing a constant or varying predetermined force. Background technique [0002] Ergonomic considerations have grown in importance in recent years for several reasons. For example, workers are often more productive when working in an ergonomically friendly environment. Additionally, when workers are forced to work in ergonomically inappropriate environments, they can be injured and / or perform at substandard levels. [0003] Many jobs involve working with a personal computer and / or monitor. In these jobs, the personal computer and / or monitor may be used by multiple operators at different times of the day. In some environments, one computer and / or monitor may be used by multiple people of different sizes and with different preferences during the course of a day. Given the differences in people's sizes and their prefere...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): F16M11/00
CPCF16M11/105F16M11/046F16M2200/027F16M11/42B66B9/02F16M11/30F16M2200/048F16M2200/044F16M11/2021F16M11/18F16M11/24
Inventor 哈里·C.·斯威勒穆斯塔法·A.·埃尔贡罗伯特·W.·弗吕尔舒安·C.·林德布拉德杰弗里·M.·伊莱亚森史蒂文·尼斯特勒罗恩·萨尔茨乔·芬克
Owner ERGOTRON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products