Method of treating sodium-silicon slag by chlorination method
A technology of chlorination and chlorination slag, which is applied in the field of sodium-silicon slag treatment by chlorination, which can solve the problems of inability to recover alumina, high concentration of sodium aluminate eluate, and low recovery rate of alumina, and facilitate large-scale Industrialized production, reduced production links, and low production costs
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0041] The method that chlorination method of the present invention handles sodium silicon slag, step is as follows:
[0042] (1) Dry 100 g of sodium-silicon slag, the reducing agent is coke powder, the particle size (d50)=100 μm, and the mass ratio of sodium-silicon slag to reducing agent is 10:1. The chlorination temperature is 460-540°C, the chlorination time is 15 minutes, and the controlled flow rate of chlorine gas is 0.2kg / min.kg sodium silicon slag.
[0043] (2) Control the liquid-solid ratio to 5, use distilled water to wash the chlorinated slag at room temperature in a water tank, filter and wash to obtain 60 ml of sodium chloride solution.
[0044] In (3), add the water-washed chlorinated slag of step (2) into the water tank for washing again, the liquid-solid ratio is controlled at 10, and washed twice to PH=7, after drying, it is added to a high-temperature furnace for roasting, the roasting temperature is 1900 ° C, and the time is: After 1.5 hours, 40 g of mulli...
Embodiment 2
[0046] The method that chlorination method of the present invention handles sodium silicon slag, step is as follows:
[0047] (1) Dry 100 g of sodium-silicon slag, the reducing agent is graphite powder, the particle size (d50) is 80 μm, and the mass ratio of sodium-silicon slag to reducing agent is 10:1. The chlorination temperature is 450-540°C, the chlorination time is 14 minutes, and the chlorine gas control flow rate is 0.2kg / min.kg sodium silicon slag.
[0048] (2) with embodiment 1
[0049] (3) The water-washed chlorinated slag obtained in (2) is added into a reducing agent again. 18min, chlorine control flow rate is 0.4kg / min.kg
[0050] Wash the chlorinated slag with water.
[0051] (4) When the chlorinated tail gas is condensed, the condensation point temperature of the silicon tetrachloride solution is 52° C. to obtain 15 ml, and the condensation temperature of the aluminum chloride solution is controlled to 180° C. to obtain 10 ml.
[0052] (5) Wash the chlorina...
Embodiment 3
[0054] The method that chlorination method of the present invention handles sodium silicon slag, step is as follows:
[0055] (1) Dry 100 g of sodium-silicon slag, the reducing agent is graphite powder, the particle size (d50) is 80 μm, and the mass ratio of sodium-silicon slag to reducing agent is 5:1. The chlorination temperature is 780-850°C, the chlorination time is 20 minutes, and the chlorine gas control flow rate is 0.45kg / min.kg sodium silicon slag.
[0056] (2) When the chlorinated tail gas is condensed, the condensation point temperature of the silicon tetrachloride solution is 50° C. to obtain 15 ml, and the condensation temperature of the aluminum chloride solution is controlled to 180° C. to obtain 10 ml.
[0057] (3) Control the liquid-solid ratio to 5, use distilled water to wash the chlorinated slag at room temperature in a water tank, filter and wash to obtain 60 ml of sodium chloride solution. Retain 3g of water-washed chloride residue.
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com