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Coating device

a technology of coating device and coating surface, which is applied in the manufacture of coatings, pretreated surfaces, record carriers, etc., can solve problems such as degrading throughput, and achieve the effect of preventing a degradation of throughpu

Inactive Publication Date: 2014-01-16
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0012]The invention is made in view of such circumstances, and an object thereof is to provide a coating device capable of preventing a degradation of the throughput.
[0035]According to the aspect of the invention, it is possible to provide the coating device capable of preventing a degradation of the throughput.

Problems solved by technology

Since it is not possible to perform the process with respect to the substrate while the environment is adjusted, the throughput is degraded.

Method used

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Embodiment Construction

[0056]An embodiment of the invention will be described by referring to the drawings.

[0057]FIG. 1 is a plan view illustrating a schematic configuration of a substrate processing system SYS according to the embodiment. FIG. 2 is a front view illustrating a schematic configuration of the substrate processing system SYS. FIG. 3 is a side view illustrating the schematic configuration of the substrate processing system SYS.

[0058]In the embodiment, the directions of the drawings are simply marked by using the XYZ coordinate system for the description of the configuration of the substrate processing system SYS. In the XYZ coordinate system, the left / right direction of the drawings is marked as the X direction and the direction perpendicular to the X direction in the plan view is marked as the Y direction. The direction perpendicular to the plane including the axes of the X direction and the Y direction is marked as the Z direction. In each of the X direction, the Y direction, and the Z dire...

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Abstract

A coating device including a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion.

Description

[0001]This application is a divisional of U.S. application Ser. No. 13 / 116,941, filed May 26, 2011, which claims priority under 35 U.S.C. §119(a)-(e) to Japanese Patent Application No. 2010-123193, filed May 28, 2010, the content of which is incorporated herein by reference.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to a coating device.[0004]2. Description of Related Art[0005]In a substrate processing system that forms a thin coating film such as a resist film on, for example, various substrates such as a semiconductor substrate, a glass substrate constituting a liquid panel, and a substrate constituting a hard disk, a coating device forming a coating film on the substrate while rotating the substrate has been used. Such a coating device generally adopts a configuration in which the substrate is laid down in parallel to the horizontal plane and the substrate rotates while the lower surface thereof is held.[0006]On the other hand, in...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B05C5/02
CPCB05C5/02B05D1/002B05D1/26G11B5/842B05C9/04B05D3/007H01L21/67155B05B13/0228B05B13/02H01L21/67051B05B13/0278
Inventor SHIMAI, FUTOSHISATO, AKIHIKOSAHODA, TSUTOMUMARUYAMA, KENJI
Owner TOKYO OHKA KOGYO CO LTD
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