Method for processing a semiconductor wafer

Abstract

An apparatus for processing a semiconductor wafer or similar article includes a reactor having a processing chamber formed by upper and lower rotors. The wafer is supported between the rotors. The rotors are rotated by a spin motor. A processing fluid is introduced onto the top or bottom surface of the wafer, or onto both surfaces, at a central location. The fluid flows outwardly uniformly and in all directions. A wafer support automatically lifts the wafer, so that it can be removed from the reactor by a robot, when the rotors separate from each other after processing.

Description

[0001] This Application is a Continuation of U.S. patent application Ser. No. 10 / 202,074, filed Jul. 23, 2002, and now pending, and incorporated herein by reference, which is a is a Continuation of U.S. patent application Ser. No. 09 / 437,711, filed Nov. 10, 1999, now U.S. Pat. No. 6,423,642, which is: [0002] 1) a Continuation-In-Part of and U.S. National Phase of International Patent Application No. PCT / US99 / 05676, filed Mar. 15, 1999; [0003] 2) a Continuation-In-Part of U.S. patent application Ser. No. 09 / 113,435, filed Jul. 10, 1998, now U.S. Pat. No. 6,264,752; [0004] 3) a Continuation-in-Part of U.S. patent application Ser. No. 09 / 041,901, filed Mar. 13, 1998, now U.S. Pat. Nos. 6,350,319; and [0005] 4) a Continuation-in-Part of U.S. patent application Ser. No. 60 / 116,750 filed Jan. 23, 1999.BACKGROUND OF THE INVENTION [0006] The semiconductor manufacturing industry is constantly seeking to improve the processes used to manufacture microelectronic circuits and components, such a...

AI Technical Summary

Benefits of technology

[0010] Additionally, the reactor includes several advantageous mechanical features including those that allow the reactor to be used with robotic wafer transfer equipment, those that allow the reactor to be readily re-configured for different processes, and those that allow the processing chamber of the reactor to be easily removed and serviced.

Problems solved by technology

However, it has now been recognized that demands for future semiconductor manufacturing processes may ultimately require more control and economic efficiency from the reactor.

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