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Zero-Abbe error measuring system and its method

An error measurement, zero Abbe technology, applied in the field of measurement systems, can solve problems such as Abbe error, and achieve the effect of reducing cost and complexity

Inactive Publication Date: 2007-07-04
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The grating 120 is set under the mobile platform 100. This structure will also cause Abbe error because the positioning point and the actual measurement position fall in different positions.

Method used

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Embodiment Construction

[0047] FIG. 4 is a schematic diagram of a zero Abbe error measurement system according to an embodiment of the present invention. In order to make the diagram simple and easy to read, the detailed mechanical structure of the system itself is omitted, and those skilled in the art can make appropriate designs according to the following description.

[0048]The zero Abbe error measurement system of the present invention mainly includes two parts, one part is the shape detection subsystem, and the other part is the platform positioning measurement subsystem. As shown in FIG. 4 , the morphology detection subsystem is mainly composed of a detection device 250 which has a probe and can detect the surface morphology of the sample to be measured (hereinafter referred to as the sample) 212 . The sample 212 to be measured is placed on a 3D moving table 200 via a stage 210 . The mobile platform 200 can move along the XYZ axes shown in the figure, so that the detection device 250 can dete...

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Abstract

A zero Abelian error measuring system is disclosed that includes: moving platform, detecting equipment, the first and second three-dimensional optical rulers. The moving platform is used to load the sample to be measured. The detecting equipment is used to detect the sample and measure the perpendicular height of observation point relative to sample. The first and second three-dimensional optical rulers are mounted separately on the moving platform face to face secluded by the sample; the height of the first and second three-dimensional optical rulers can be adjusted tiny along the perpendicular height, the perpendicular height of the first and second three-dimensional optical rulers relative to the moving platform is same as the perpendicular height of observation point to measure the sample.

Description

technical field [0001] The invention relates to a measuring system and its method, and in particular to a measuring system and its method capable of eliminating Abbe errors. Background technique [0002] The architecture of traditional three-dimensional micro (nano) measurement systems, such as scanning probe microscopy (SPM), atomic force microscope (AFM) and coordinate measuring machine (coordinate measuring machine, CMM), is mainly based on the form It is composed of sub-systems such as appearance detection system and / or positioning platform. The main work of the shape detection system is to obtain the surface information of the object to be measured by means of probes and other methods. The positioning platform system is responsible for driving the probe carrier or mobile platform, so that the whole system can complete three-dimensional scanning and measurement actions. However, there is a certain degree of angular deviation between the placement position of the linear...

Claims

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Application Information

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IPC IPC(8): G01N13/10G12B21/20G01B11/14G01B21/20G01Q40/00
Inventor 吴乾埼翁汉甫许正治王振宇温博浚
Owner IND TECH RES INST
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