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Ultralow thermal expansion devitrified glass

A kind of glass-ceramic, ultra-low technology, applied in the field of ultra-low expansion glass-ceramic, which can solve the problems of high expansion coefficient of glass-ceramic and difficult to meet requirements, etc.

Inactive Publication Date: 2006-10-18
上海新沪玻璃有限公司
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  • Summary
  • Abstract
  • Description
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AI Technical Summary

Problems solved by technology

[0002] At present, glass-ceramic expansion coefficients of mirrors, flat mirrors, templates, scales, grating substrates, processing templates, and laser gyro cavities used for precision optics are relatively high, which is difficult to meet the requirements

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0008] The present invention is further described below with embodiment.

[0009] components

[0010] Manufacture of ultra-low expansion glass-ceramic V by using the above formula 02 Firstly, the components are mixed evenly, using high-temperature melting technology, in a high-temperature-resistant quartz ceramic crucible, melted at 1580-1630°C, released at 1450°C, shaped, inspected, and then nucleated at 660-690°C. Crystallization at 690-720°C, precision annealing at 640-540°C.

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PUM

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Abstract

The present invention discloses one kind of ultralow thermal expansion devitrified glass used for reflector, planar mirror, template and other precise optical elements. It has the material composition of: SiO2 47.2-49.1(in wt%, the same as below),Al2O3 27.6-29.0,Sb2O3 0.78-0.82,As2O3 0.30-0.35,BaO 2.98-3.05,ZnO 2.00-2.05, CaO 2.28-2.33,MgO 0.5-1.0,Li2O 7.1-7.5,P2O5 4.0-4.4,ZrO2 1.2-1.7 and TiO2 1.4-1.5 . The technological process includes the following steps: mixing the components, high temperature smelting in high temperature quartz-ceramic crucible at 1580-1630 deg.c, tapping at 1450 deg.c, forming, inspection, nucleating at 660-690 deg.c, crystallizing at 690-720 deg.c, precise annealing at 640-540 deg.c.

Description

Technical field [0001] The present invention is a grade in the large category of lithium-aluminum-silicon glass-ceramics, and is used for large-scale astronomical telescope mirror embryos, precision optical mirrors, flat mirrors, templates, scales, grating substrates, processing templates, and laser gyro cavities. Material. Background technique [0002] At present, glass-ceramic expansion coefficients of mirrors, flat mirrors, templates, scales, grating substrates, processing templates, and laser gyro cavities used for precision optics are relatively high, which is difficult to meet the requirements. Contents of the invention [0003] The purpose of the present invention is to provide an ultra-low expansion glass-ceramic with good expansion coefficient (α), melting performance and crystallization performance. [0004] The present invention selects SiO 2 、Al 2 o 3 , Sb 2 o 3 、As 2 o 3 , BaO, ZnO, CaO, MgO, Li 2 O.P 2 o 5 , ZrO 2 、TiO 2 system based on the formu...

Claims

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Application Information

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IPC IPC(8): C03C10/14
CPCC03C3/097C03C10/00
Inventor 黄维彦谢瑞虎刘宏伟
Owner 上海新沪玻璃有限公司
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