Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Formula of sun screen fingernail oil

A nail polish and formula technology, applied in pharmaceutical formulations and other directions, can solve the problems of poor nail polish firmness and gloss, poor anti-ultraviolet radiation performance, poor absorption capacity, etc., achieve excellent sunscreen effect, improve brightness and firmness, Guaranteed smooth finish

Inactive Publication Date: 2005-03-23
杜洪良
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention mainly solves the technical problems that the existing nail polish has poor sun protection performance, poor ultraviolet radiation protection performance, especially poor ultraviolet absorption ability in the UVA region, and provides a nail polish with better sun protection effect
[0005] The invention also solves the technical problem of poor firmness and gloss of the existing nail polish, and provides a nail polish with good gloss and firmness

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Formula of sun screen fingernail oil

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] Example 1: Now taking the first column in Table 1 as an example, sunscreen A in the table is 4-methoxycinnamic acid-2-ethylhexyl; sunscreen B is 2,2'-methylene-bis -6-(2H-benzotriazol-2 base)-4-(tetramethyl-butyl)-1,1,3,3-phenol, specifically stated as follows: Weigh 23 parts of ethyl acetate and 29 Parts of butyl acetate, mix and stir. Weigh 14 parts of nitrocellulose (1 / 2S), add it into the above mixture under stirring, and stir at 1200 rpm for 5 min. Then weigh 2 parts of 4-methoxycinnamic acid-2-ethylhexyl sunscreen and 3 parts of 2,2'-methylene-bis-6-(2H-benzotriazole-2 base) - Add 4-(tetramethyl-butyl)-1,1,3,3-phenol sunscreen to the above mixture, and stir at 1200 rpm for 5 minutes. Finally, 28 parts of amino resin and 3 parts of camphor were weighed and added thereto, and stirred at 1500 rpm for 10 min. 200 mesh sieves are filtered to make a solution, and the sunscreen nail polish finished product is packaged. The sun protection index SPF of the obtained nai...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A sun-shielding nail oil is prepared from 4-methoxy cinnamate-2-ethyl hexylester, 2,2'-methylene-bis-6-(2H -benzotriazole-2-yl)-4-(tetramethyl-butyl)-1,1,3,3-phenol, plasticizer and blightening agent.

Description

technical field [0001] The invention relates to a formula of nail polish, in particular to a sunscreen nail polish which is added with a full-band sunscreen agent and can completely block ultraviolet rays. Background technique [0002] Nail polish belongs to a large category of products in the color cosmetic series, which has the function of beautifying and modifying nails, but has poor UV protection for nails. In addition, ordinary chemical sunscreens are effective against ultraviolet rays in the UV-B area, but have little effect on ultraviolet rays in the UV-A area, and the firmness and gloss of nail polish after adding sunscreens will be greatly reduced. Due to environmental reasons, sunscreen products are becoming more and more popular among consumers, but to introduce the concept of sunscreen into nail polish, there is no similar nail polish product with new functions in the domestic and foreign markets at present. People have almost no choice for nail maintenance exce...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
Inventor 杜洪良
Owner 杜洪良
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products