Automatic cleaning tank for semiconductor wafer tank type cleaning machine

Abstract

The invention belongs to the technical field of wafers, and particularly relates to an automatic cleaning tank for a semiconductor wafer tank type cleaning machine, which comprises a rack, and further comprises a tank cover, a cleaning tank body, a supporting device, a filtering device and a flushing device which are arranged on the rack, the two tank covers are hinged to the two sides of the top of the rack, and the cleaning tank body is fixedly installed on the inner wall of the rack. According to the automatic cleaning tank for the semiconductor wafer tank type cleaning machine, by arranging the supporting device and the flushing device, a wafer can be supported, meanwhile, the wafer can be driven to rotate in the cleaning process, the wafer is flushed in an all-around mode, the idler wheels stretch into the gaps in the side walls of the flower basket, the wafer is lifted up, then rotation is achieved, and meanwhile the wafer can be cleaned conveniently. According to the wafer cleaning device, spraying holes of a part of the rotating nozzles are arranged to be eccentric, then the rotating nozzles are driven to rotate through water pressure driven by the water suction pump, the problem of cleaning dead corners is solved, and the technical problem that certain cleaning dead corners exist when wafers are cleaned through existing wafer cleaning equipment is solved.

Description

technical field [0001] The invention relates to the technical field of wafers, in particular to an automatic cleaning tank for a semiconductor wafer tank cleaning machine. Background technique [0002] Wafer refers to the silicon wafer used in the production of silicon semiconductor integrated circuits. Because of its circular shape, it is called a wafer; it can be processed into various circuit element structures on the silicon wafer and become an IC with specific electrical functions. product. [0003] The existing wafer needs to be cleaned during production. The rectangular cleaning tank in the existing cleaning equipment is large in volume, which is not conducive to the backflow temperature control of the chemical cleaning solution; when the wafer is cleaned, use a flower basket to directly place it in the cleaning tank , and then the cleaning liquid is sprayed upwards from the bottom to clean. This kind of cleaning can only realize the cleaning in the vertical directio...

AI Technical Summary

Problems solved by technology

[0004] Based on the large volume of the existing rectangular cleaning tank for wafer cleaning equipment, which is not conducive to the backflow temperature control of the chemical cleaning liquid, there is a certain cleaning dead angle, the cleaning is not thorough, and it is not conducive to the technical problems of overall linkage and energy saving. The present invention proposes Automatic cleaning tank for semiconductor wafer tank cleaning machine

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