Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Millimeter wave generator based on cascaded space-time symmetric optical fiber F-P resonant cavity

A symmetrical optical fiber, F-P technology, applied in the millimeter wave field, can solve problems such as limited application scenarios

Pending Publication Date: 2022-03-01
NANKAI UNIV
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Existing technical methods generally use signal sources that can generate specific frequency ranges for millimeter waves with specific needs, which limits their application scenarios. Therefore, how to generate tunable broadband millimeter waves is one of the important directions for the future development of millimeter wave technology. one

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Millimeter wave generator based on cascaded space-time symmetric optical fiber F-P resonant cavity
  • Millimeter wave generator based on cascaded space-time symmetric optical fiber F-P resonant cavity
  • Millimeter wave generator based on cascaded space-time symmetric optical fiber F-P resonant cavity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0044] Such as figure 1 Shown is a schematic structural diagram of a millimeter-wave generator based on cascaded parity-time-symmetric fiber F-P resonators, which includes a dual-wavelength laser 1 based on cascaded par-time-symmetric fiber F-P resonators, an erbium-doped fiber amplifier 2, a photoelectric detector Device 3. The dual-wavelength laser 1 is connected to the erbium-doped fiber amplifier 2 through an ordinary single-mode fiber, and the output light of the erbium-doped fiber amplifier is guided into the photodetector 3 through the single-mode fiber for frequency mixing.

[0045] Such as figure 2 Shown is a schematic structural diagram of a dual-wavelength laser 1 based on cascaded parity time-symmetric fiber F-P resonators, including: a 980nm pump laser 4; first and second wavelength division multiplexing couplers 5-I, 5-II; The first and second Bragg gratings 8-I and 8-II; the first and second soft microfluidic conduits 7-I and 7-II; erbium-doped ion sol-gel fi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
thicknessaaaaaaaaaa
refractive indexaaaaaaaaaa
Login to View More

Abstract

The invention discloses a millimeter wave generator based on a cascaded space-time symmetric optical fiber F-P resonant cavity. The generator comprises a dual-wavelength laser based on the cascaded space-time symmetric optical fiber F-P resonant cavity, an erbium-doped optical fiber amplifier and a photoelectric detector. The dual-wavelength laser comprises a 980nm pump light source, a wavelength division multiplexing coupler, a Bragg grating, a quartz capillary tube, a soft micro-flow conduit and a common single-mode fiber, wherein the end face of the Bragg grating is spin-coated with an erbium-doped ion sol-gel thin film and an erbium-free ion sol-gel thin film. A gain and loss thin film is used for constructing an F-P resonant cavity structure in space-time symmetry, dual-wavelength laser output can be obtained near a singular point, output laser is amplified by an erbium-doped optical fiber amplifier and then input into a photoelectric detector for frequency mixing, millimeter wave output can be obtained, and the millimeter wave output frequency can be tuned by filling a functional material and adjusting the refractive index of the functional material. The millimeter wave generator has the advantages of wide output frequency range, continuous frequency tuning, easiness in integration, high compatibility with an optical fiber system and the like.

Description

technical field [0001] The invention belongs to the technical field of millimeter waves, and in particular relates to a dual-wavelength laser cascaded with parity time-symmetric fiber F-P resonators and a broadband millimeter-wave generator thereof. The dual-wavelength laser is applied to millimeter-wave parity time-symmetric fiber F-P resonators generator. Background technique [0002] Millimeter waves refer to electromagnetic waves with a wavelength range of 0.1mm-1mm. They are located in the overlapping region of microwaves and far-infrared waves on the electromagnetic spectrum. Therefore, millimeter waves have the characteristics of both types of waves. Compared with light waves, millimeter waves have the advantages of small attenuation when propagating through the atmospheric window, and are less affected by natural light and thermal radiation sources. They play a pivotal role in the fields of communications and radar. and spectroscopy are of great significance. Exist...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H04B10/50H01S3/067H01S3/08H04B10/25H04J14/02
CPCH04B10/503H04J14/0202H01S3/06758H01S3/0809H04B10/25
Inventor 张昊范淼森龚中华林炜刘波刘艳格王志
Owner NANKAI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com