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Multi-point deep positioning stripping and removing method for Indian pattern

An Indian pattern, deep layer technology, applied in the field of medical cosmetology, can solve the problems of incomplete wrinkle removal, inaccurate positioning, and long recovery period, so as to reduce the risk of skin infection, reduce the trauma surface, and shorten the recovery period.

Inactive Publication Date: 2021-09-03
博恩美荟剥离美学(深圳)有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The purpose of the present invention is to provide a multi-point deep positioning stripping removal method for Indian lines, so as to solve the problems of inaccurate positioning, large wound surface, incomplete wrinkle removal and long recovery period in the above-mentioned background technology

Method used

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  • Multi-point deep positioning stripping and removing method for Indian pattern

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Embodiment Construction

[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0030] see figure 1 , an embodiment provided by the present invention: a multi-point deep positioning stripping removal method for Indian lines, comprising the following steps: Step 1, facial cleansing; Step 2, local anesthesia; Step 3, multi-point positioning; Step 4, disinfection Sterilization; Step 5, equipment disinfection; Step 6, shallow peeling; Step 7, deep peeling; Step 8, facial detumescence; Step 9, postoperative repair;

[0031] In the above step ...

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Abstract

The invention discloses a multi-point deep positioning stripping and removing method for an Indian pattern. The method comprises the following steps: S1, face cleaning; S2, local anesthesia; S3, multi-point positioning; S4, disinfection and sterilization; S5, instrument disinfection; S6, shallow stripping; S7, deep stripping; S8, face detumescence; and S9, postoperative repair. According to the invention, by respectively carrying out stripping stimulation on the shallow layer and the deep layer of the skin, multi-layer stimulation repair is implemented; through setting of a positioning point, fixed-point and fixed-position stimulation repair is implemented; the skin is cleaned before stripping; the stripping region is disinfected for twice; meanwhile, a stripping microneedle is also disinfected and sterilized, so that the risk of skin infection after stripping is reduced; by regularly and periodically coating ACMETEA and skin moisturizing and repairing dressing after the operation and applying a facial mask containing hyaluronic acid 7-10 days after the operation, shortening of the postoperative recovery period is facilitated.

Description

technical field [0001] The invention relates to the technical field of medical cosmetology, in particular to a multi-point deep positioning stripping removal method for Indian lines. Background technique [0002] "Indian lines", also known as zygomatic grooves, refer to the wrinkles on the lower side of the cheekbones due to the relaxation of the zygomatic ligament and surrounding muscles. Wrinkles in the form of oblique lines, what we call "Indian lines" look more like the lines on the faces of Indians, so they are called "Indian lines". Most of the Indian lines on the market today are removed by hyaluronic acid injection and fat filling. , prone to recurrence and repeated situations, so it is necessary to remove the subcutaneous fibrous tissue thoroughly. The principle of removing wrinkles is to use hair-thin microneedles to softly peel the subcutaneous microtissue and form a wound under the skin. , during the repair process of micro-tissues will continue to produce new c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61B17/32A61M35/00A61L2/18
CPCA61B17/00234A61B17/32A61M35/006A61M35/10A61L2/18A61B2017/00761A61B2017/00792A61L2202/24
Inventor 陈永吉陈文钰
Owner 博恩美荟剥离美学(深圳)有限公司
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